磁控溅射沉积BN薄膜的腐蚀和摩擦学行为

Q4 Materials Science
Mukhtiar Singh, Hitesh Vasudev, Ravinder Kumar
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引用次数: 10

摘要

以六方氮化硼为靶材,采用射频磁控溅射法在316L不锈钢基体上合成氮化硼涂层。沉积过程在三种不同的N2和Ar系统混合状态下进行。扫描电子显微镜(SEM)和x射线衍射(XRD)技术研究了不同N2和Ar等离子体比例下氮化硼薄膜的微观结构形态和组成。本研究旨在研究改变N2气比对c-BN涂层结构和结构形态的影响。使用QAr/QN2-5/1比率,增加微观结构的一致性和进一步的c-BN台阶形成表明了生产优质立方氮化硼膜的基本技术。通过电化学腐蚀试验和力学分析研究了氮化硼涂层的腐蚀和摩擦学行为,结果表明,在氮化硼状态下,氮化硼涂层在腐蚀和摩擦学性能方面有了更多的改善。BN2体系显示出约1.114 mpy(英里/年)的最大耐腐蚀性。发现在BN2薄膜的情况下346Gpa大小的杨氏模量与基材和其它两种薄膜相比更高。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Corrosion and Tribological Behaviour of BN Thin Films Deposited Using Magnetron Sputtering
Boron nitride coatings were synthesised on 316L stainless steel substrates through the radio frequency magnetron sputtering from a target made of hexagonal boron nitride. The process of deposition was conducted in three separate N2 and Ar system mixing regimes. Scanning electron microscopy (SEM) and x-ray diffraction (XRD) techniques investigated the microstructure morphology and composition of the BN films at varying ratio of N2 and Ar plasma. This research aimed to examine the effects of changing the N2 gas ratio on the structure and structural morphology of c-BN coatings. Using QAr / QN2-5/1 ratios, an increased consistency of the microstructure and further c-BN step formation suggest a fundamental technique for producing superior quality cubic boron nitride films. The electrochemical corrosion test and mechanical analysis was performed to study corrosion and tribological behaviour of the BN coating, and the results showed more improvement in corrosion and tribilogical behaviour in case of BN2 regime. The BN2 regime showed a maximum corrosion resistance of around 1.114 mpy (miles per year). The young's modulus of 346Gpa in magnitude in case of BN2 thin film was found to be higher as compared to base material and other two thin films.
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来源期刊
CiteScore
2.60
自引率
0.00%
发文量
22
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