二阶稳定和不稳定时滞过程的PID控制器和噪声滤波器的改进设计

IF 1 Q4 ENGINEERING, CHEMICAL
Banda Sai Rahul, M. Ajmeri
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引用次数: 2

摘要

本文采用直接合成法对二阶稳定和不稳定时滞过程设计了带噪声滤波器的PID控制器。所提出的方法涉及一个单一的设计参数λ,其值需要调整,以便在系统的性能和鲁棒性之间达到理想的平衡。提供了根据最大灵敏度值选择合适λ值的指南。在稳定、不稳定、积分和双积分动态系统测量噪声存在的情况下进行了各种计算机模拟,以说明所提出的控制方法相对于一些当代技术的优越性。计算了性能指标(积分绝对误差和积分平方误差)和鲁棒性指标(最大灵敏度M s)、互补灵敏度M t),对所提出的调优策略进行了定量性能评价。所提出的整定算法简单,与已有的方法相比,具有更好的闭环响应,具有良好的鲁棒性和平滑的噪声控制效果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Enhanced design of PID controller and noise filter for second order stable and unstable processes with time delay
Abstract In this work, a PID controller along with a noise filter is designed using direct synthesis method for second order stable and unstable processes with time delay. Proposed method involves a single design parameter λ whose value need to be adjusted such that a desired balance between performance and robustness of the system is achieved. Guidelines to select suitable values of λ based on the maximum sensitivity values are provided. Various computer simulations are performed in presence of measurement noise on stable, unstable, integrating and double integrating dynamic systems to illustrate the advantages of suggested control method over some contemporary techniques. Performance measures (integral absolute error and integral squared error) and robustness measures such as maximum sensitivity (M s), complimentary sensitivity (M t) are calculated for the quantitative performance evaluation of the proposed tuning strategy. The suggested tuning algorithm is simple and it yields improved closed loop response compared to some reported methods, satisfactory robustness and smooth control action in presence of noise.
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来源期刊
Chemical Product and Process Modeling
Chemical Product and Process Modeling ENGINEERING, CHEMICAL-
CiteScore
2.10
自引率
11.10%
发文量
27
期刊介绍: Chemical Product and Process Modeling (CPPM) is a quarterly journal that publishes theoretical and applied research on product and process design modeling, simulation and optimization. Thanks to its international editorial board, the journal assembles the best papers from around the world on to cover the gap between product and process. The journal brings together chemical and process engineering researchers, practitioners, and software developers in a new forum for the international modeling and simulation community. Topics: equation oriented and modular simulation optimization technology for process and materials design, new modeling techniques shortcut modeling and design approaches performance of commercial and in-house simulation and optimization tools challenges faced in industrial product and process simulation and optimization computational fluid dynamics environmental process, food and pharmaceutical modeling topics drawn from the substantial areas of overlap between modeling and mathematics applied to chemical products and processes.
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