增强双可见线发射的ga掺杂ZnO薄膜

Q3 Materials Science
S. Alamdari, Mohammad Mansourian, M. S. Ghamsari
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引用次数: 0

摘要

本研究采用一种简单易行的方法制备了一种高透明、发光的超薄掺镓ZnO薄膜。采用超声振动和溶胶-凝胶旋喷涂层技术同时沉积了该薄膜。采用X射线衍射(XRD)、X射线光电子能谱(XPS)、扫描电子显微镜(SEM)、紫外可见光谱(UV-Vis)和PL光谱等方法研究了纯薄膜和掺杂薄膜的结构和光学性能。XRD结果表明,纯ZnO薄膜和掺杂ZnO薄膜均具有(101)择优取向的六方纤锌矿结构。XPS和EDX研究证实了Ga离子掺入和存在于ZnO晶格结构中。掺杂样品显示出近90%的透明度,在可见光区域有强烈的蓝绿色发射。所得结果证明,所制备的薄膜可以作为光电子应用的新候选者。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Thin Ga-doped ZnO Film with Enhanced Dual Visible Lines Emission
In this study, a simple and facile route was employed to prepare a highly transparent and luminescent ultra-thin gallium doped ZnO film (GZO). The thin GZO film has been deposited using the simultaneously ultrasonic vibration and sol-gel spin-spray coating technique. The structural and optical properties of pure and doped thin films were investigated by various methods, such as X-ray diffraction (XRD), X-ray photoemission spectroscopy (XPS), scanning electron microscopy (SEM), UV-Vis, and PL spectroscopy. XRD results indicated that both pure and doped ZnO films had a hexagonal wurtzite structure with (101) preferred orientation. XPS and EDX studies confirmed the incorporation and presence of Ga ions into the ZnO lattice structure. The doped sample showed nearly 90% of transparency, and a strong blue-green emission in the visible region. The obtained results proved that the prepared thin film could be a novel candidate for optoelectronic applications.
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来源期刊
Current Nanomaterials
Current Nanomaterials Materials Science-Materials Science (miscellaneous)
CiteScore
1.60
自引率
0.00%
发文量
53
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