静力和无夹层扩散结合钛钛和钛铜板的扫描电镜分析及硬度

J. Hemanth
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引用次数: 2

摘要

在本研究中,工业纯Ti(2级)在静力作用下与Ti和Cu板扩散结合,没有任何中间层。通过光学显微镜和扫描电镜对扩散键合试样进行了显微硬度测试和微观结构分析。结果表明,结合时间(1 ~ 2 h)、结合力(250 N)、结合温度(973 ~ 1073 K)和表面粗糙度对结合区有一定的影响。结果表明,在- 973 ~ 1073 K的温度范围内,在真空中保持1 ~ 2小时,可以获得高硬度、气孔最小的接头。结合的硬度取决于界面的晶界扩散,在Ti-Cu接头中硬度达到最大。当Ti-Cu板在973 K下键合2小时时,在键合区形成Cu-Ti固溶体和不同的金属间化合物区。然而,在高温下,在键合区没有发现连续的金属间化合物区,而是出现了Ti-Cu固溶体。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Scanning Electron Microscopy (SEM) Analysis and Hardness of Diffusion Bonded Titanium-Titanium and Titanium-Copper Plates with Static Force and without Interlayers
In the present research, commercially pure Ti (grade-2) has been diffusion bonded with Ti and Cu plate under static force without any interlayers. The diffusion bonded samples were tested for micro hardness and micro structural analysis through optical microscopy and SEM. It is found from the present investigation that the bonded zone is affected by the processing variables such as bonding time (1 - 2 h), bonding force (250 N), bonding temperature (973 - 1073 K) and surface roughness. Results of the investigation revealed that temperature range of ?973 - 1073 K along with time duration of 1 - 2 hours in vacuum has resulted in a joint having high hardness with minimum pores. Hardness of the bond depends on the grain boundary diffusion at the interface and maximum hardness was achieved in the case of Ti-Cu joints. When Ti-Cu plates were used for bonding at 973 K for 2 hours, Cu-Ti solid solution along with a zone of different intermetallics was formed in the bonded zone. However, at higher temperatures, no continuous zone of intermetallics was found in the bonded region but instead Ti-Cu solid solution appeared.
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