{"title":"等离子体预处理对Hitus涂层形貌和性能的影响","authors":"L. Kvetková, Petra Hviščová, D. Medveď, F. Lofaj","doi":"10.2478/pmp-2020-0003","DOIUrl":null,"url":null,"abstract":"Abstract WC coatings prepared by High Target Utilization Sputtering (HITUS), a relatively new technology, were deposited on three types of substrates. These were silicon (111), steel (100Cr6), and ceramic (WC-Co). The influence of RF plasma power pretreatment on final properties of WC coatings was investigated with two interlayer materials for bonding. The morphology, roughness, and mechanical properties of coatings were studied. The relation between plasma RF power and roughness was found. No significant change in mechanical properties was detected with change in plasma RF power. The dependence of nanohardness and scratch behavior on HITUS WC coatings was investigated.","PeriodicalId":52175,"journal":{"name":"Powder Metallurgy Progress","volume":"20 1","pages":"21 - 29"},"PeriodicalIF":0.0000,"publicationDate":"2020-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"The Effect of Plasma Pretreatment on the Morphology and Properties of Hitus Coatings\",\"authors\":\"L. Kvetková, Petra Hviščová, D. Medveď, F. Lofaj\",\"doi\":\"10.2478/pmp-2020-0003\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Abstract WC coatings prepared by High Target Utilization Sputtering (HITUS), a relatively new technology, were deposited on three types of substrates. These were silicon (111), steel (100Cr6), and ceramic (WC-Co). The influence of RF plasma power pretreatment on final properties of WC coatings was investigated with two interlayer materials for bonding. The morphology, roughness, and mechanical properties of coatings were studied. The relation between plasma RF power and roughness was found. No significant change in mechanical properties was detected with change in plasma RF power. The dependence of nanohardness and scratch behavior on HITUS WC coatings was investigated.\",\"PeriodicalId\":52175,\"journal\":{\"name\":\"Powder Metallurgy Progress\",\"volume\":\"20 1\",\"pages\":\"21 - 29\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2020-06-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Powder Metallurgy Progress\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.2478/pmp-2020-0003\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q4\",\"JCRName\":\"Materials Science\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Powder Metallurgy Progress","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.2478/pmp-2020-0003","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"Materials Science","Score":null,"Total":0}
The Effect of Plasma Pretreatment on the Morphology and Properties of Hitus Coatings
Abstract WC coatings prepared by High Target Utilization Sputtering (HITUS), a relatively new technology, were deposited on three types of substrates. These were silicon (111), steel (100Cr6), and ceramic (WC-Co). The influence of RF plasma power pretreatment on final properties of WC coatings was investigated with two interlayer materials for bonding. The morphology, roughness, and mechanical properties of coatings were studied. The relation between plasma RF power and roughness was found. No significant change in mechanical properties was detected with change in plasma RF power. The dependence of nanohardness and scratch behavior on HITUS WC coatings was investigated.
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