当某些双因素相互作用很重要时,使用最小像差标准选择基线设计

IF 0.7 Q3 STATISTICS & PROBABILITY
Anqi Chen, Cheng-Yu Sun, Boxin Tang
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引用次数: 2

摘要

摘要本文考虑了在基线参数化条件下,当某些双因素相互作用很重要时,如何选择两水平设计的问题。我们提出了一种最小像差准则,使不可忽略的影响所引起的偏差最小化。利用这一准则,可以进一步区分一类优化设计,并提出了一种从d类最优设计中找出最小像差设计的算法。总结了16轮和20轮的设计以供实际使用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Selecting baseline designs using a minimum aberration criterion when some two-factor interactions are important
ABSTRACT This article considers the problem of selecting two-level designs under the baseline parameterisation when some two-factor interactions are important. We propose a minimum aberration criterion, which minimises the bias caused by the non-negligible effects. Using this criterion, a class of optimal designs can be further distinguished from one another, and we present an algorithm to find the minimum aberration designs among the D-optimal designs. Sixteen-run and twenty-run designs are summarised for practical use.
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来源期刊
CiteScore
0.90
自引率
20.00%
发文量
21
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