FeNi薄膜的磁性能

IF 1.5 4区物理与天体物理 Q2 PHYSICS, MULTIDISCIPLINARY

Brazilian Journal of Physics Pub Date : 2023-07-19 DOI:10.1007/s13538-023-01338-1

José Luis Hidalgo González

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引用次数: 0

摘要

采用电沉积法制备了不同厚度的FeNi薄膜，并采用等温剩余磁化(IRM)和直流退磁(DCD)技术研究了其磁性能。测定了FeNi薄膜的相互作用系数α，考察了偶极场对薄膜滞回线的影响。通过IRM和DCD剩磁曲线得到了偶极相互作用场，并用∆M图对磁相互作用进行了研究。

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Magnetic Properties In FeNi Thin Films

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Magnetic Properties In FeNi Thin Films

Thin FeNi films with varying thicknesses were fabricated via electrodeposition, and their magnetic properties were investigated using isothermal remanent magnetization (IRM) and direct current demagnetization (DCD) techniques. The interaction coefficient α of the thin FeNi films was determined, and the influence of the dipolar field on the hysteresis loop of the films was examined. The dipolar interaction field was obtained from the IRM and DCD remanence curves, and the magnetic interactions were studied using the ∆M plot.

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来源期刊

Brazilian Journal of Physics 物理-物理：综合

CiteScore

2.50

自引率

6.20%

发文量

189

审稿时长

6.0 months

期刊介绍： The Brazilian Journal of Physics is a peer-reviewed international journal published by the Brazilian Physical Society (SBF). The journal publishes new and original research results from all areas of physics, obtained in Brazil and from anywhere else in the world. Contents include theoretical, practical and experimental papers as well as high-quality review papers. Submissions should follow the generally accepted structure for journal articles with basic elements: title, abstract, introduction, results, conclusions, and references.