不同溅射参数对有间层和无间层MoS2涂层厚度和硬度的影响

IF 1 4区 工程技术 Q4 ENGINEERING, MECHANICAL
M. Poyraz, R. Tunay
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引用次数: 0

摘要

本研究的目的是;研究了不同溅射参数对射频(RF)磁控溅射法沉积MoS2薄膜厚度和硬度的影响。因此,在440C钢基体上涂覆二硫化钼薄膜,在剪切过程中表现出固体润滑剂的润滑作用和低摩擦特性。在aisi440c衬底上沉积了无夹层的MoS2薄膜和有夹层的(Ti/Cr)薄膜。在涂层过程中,通过改变衬底沉积温度和射频溅射功率等沉积参数,得到了15种不同沉积参数下涂层的钢盘组。利用扫描电镜对膜的厚度进行了测量。在不同的放大倍数下观察表面形貌。用能谱仪对其组成和结构进行了分析。采用纳米压痕系统测定了涂层的硬度和弹性模量。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
The effect of different sputtering parameters on coating thickness and hardness in MoS2 coated films with and without interlayer
The aim of this study is; to examine the effect of different sputtering parameters on coating thickness and hardness in MoS2 films which are deposition of radio frequency (RF) magnetron sputtering method. Therefore, 440C steel substrates are coated with MoS2 thin films which exhibit lubrication as a solid lubricant and low friction characteristic during shear. MoS2 films with no interlayer and (Ti/Cr) with interlayer were deposited on the AISI 440C substrates. During the coating, by changing the deposition parameters such as the substrate deposition temperature and RF sputtering power, steel disc groups which are coated in 15 different deposition parameters were obtained. The thicknesses of the films were measured by using a SEM. The surface topographies were observed at different magnifications. The composition and structure were analysed by energy dispersive spectroscopy (EDS). A nano-indentation system was used to determine the hardness and elesticity modules of the coatings.
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来源期刊
CiteScore
1.60
自引率
25.00%
发文量
21
审稿时长
>12 weeks
期刊介绍: IJSurfSE publishes refereed quality papers in the broad field of surface science and engineering including tribology, but with a special emphasis on the research and development in friction, wear, coatings and surface modification processes such as surface treatment, cladding, machining, polishing and grinding, across multiple scales from nanoscopic to macroscopic dimensions. High-integrity and high-performance surfaces of components have become a central research area in the professional community whose aim is to develop highly reliable ultra-precision devices.
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