溅射沉积Mo薄膜：结构、表面形貌、密度、残余应力、电阻率和机械响应的多模式表征

IF 2.4 3区材料科学 Q3 ENGINEERING, MANUFACTURING

Integrating Materials and Manufacturing Innovation Pub Date : 2023-04-24 DOI:10.1007/s40192-023-00297-4

M. Kalaswad, J. Custer, S. Addamane, R. M. Khan, L. Jauregui, T. Babuska, A. Henriksen, F. DelRio, R. Dingreville, B. Boyce, D. Adams

引用次数: 1

摘要

本文章由计算机程序翻译，如有差异，请以英文原文为准。

Sputter-Deposited Mo Thin Films: Multimodal Characterization of Structure, Surface Morphology, Density, Residual Stress, Electrical Resistivity, and Mechanical Response

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Sputter-Deposited Mo Thin Films: Multimodal Characterization of Structure, Surface Morphology, Density, Residual Stress, Electrical Resistivity, and Mechanical Response

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来源期刊

Integrating Materials and Manufacturing Innovation Engineering-Industrial and Manufacturing Engineering

CiteScore

5.30

自引率

9.10%

发文量

审稿时长

39 days

期刊介绍： The journal will publish: Research that supports building a model-based definition of materials and processes that is compatible with model-based engineering design processes and multidisciplinary design optimization; Descriptions of novel experimental or computational tools or data analysis techniques, and their application, that are to be used for ICME; Best practices in verification and validation of computational tools, sensitivity analysis, uncertainty quantification, and data management, as well as standards and protocols for software integration and exchange of data; In-depth descriptions of data, databases, and database tools; Detailed case studies on efforts, and their impact, that integrate experiment and computation to solve an enduring engineering problem in materials and manufacturing.