ar等离子体处理和退火对热蒸发β-In2S3薄膜的影响

IF 1.7 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY
S. Rasool, K. Saritha, K. Reddy, M. Tivanov, O. Korolik, V. Gremenok, S. Zimin, I. Amirov
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引用次数: 1

摘要

本文研究了退火和氩等离子体处理对热蒸发β-In2S3薄膜结构、形貌和光学性能的影响。在Ar等离子体处理过程中,观察到一些有趣的结果,即在In2S3膜表面形成了金属铟纳米结构阵列,其横向平均尺寸为20–100 nm,高度小于70 nm的准球形或扩展液滴形状。这里,Ar等离子体处理作为在膜表面上自形成金属铟纳米结构的新策略。此外,在Ar等离子体处理后,In2S3薄膜的光学吸收从104 cm−1增强到107 cm−1,而光学带隙能量从2.71 eV降低到2.50 eV。负载在半导体表面的金属纳米结构可以作为电子陷阱,有效地防止光生电子-空穴对的复合。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Effect of Ar-plasma treatment and annealing on thermally evaporated β-In2S3 thin films
In the present study, the effect of annealing and Ar-plasma treatment on structural, morphological and optical properties of thermally evaporated β-In2S3 thin films has been investigated. During Ar-plasma treatment, some interesting results were observed that an array of metallic indium nanostructures was formed over In2S3 film surface with quasi-spherical or spread droplet shapes of an average size of 20–100 nm in the lateral direction and a height of less than 70 nm. Here, the Ar-plasma treatment serves as a new strategy for the self-formation of metallic indium nanostructures over the film surface. Further, the optical absorption of In2S3 films has been enhanced from 104 to 107 cm−1 while the optical band gap energy decreased from 2.71 eV to 2.50 eV after Ar-plasma treatment. The metallic nanostructures loaded on semiconductor surface can act as an electron trap that can effectively prevent the recombination of photo-generated electron-hole pairs.
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来源期刊
Advances in Natural Sciences: Nanoscience and Nanotechnology
Advances in Natural Sciences: Nanoscience and Nanotechnology NANOSCIENCE & NANOTECHNOLOGYMATERIALS SCIE-MATERIALS SCIENCE, MULTIDISCIPLINARY
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