用于光谱成像仪的紫外/可见/近红外发光二元反射光栅:两种光刻技术的研究

IF 1.9 4区物理与天体物理 Q3 OPTICS

Journal of the European Optical Society-Rapid Publications Pub Date : 2023-01-12 DOI:10.1051/jeos/2023004

M. Lee, J. Cholet, A. Delboulbé, R. Guillemet, B. Loiseaux, P. Garabédian, T. Flügel-Paul, T. Benkenstein, S. Sadlowski, N. Tetaz, R. Windpassinger, A. Baselga Mateo

{"title":"用于光谱成像仪的紫外/可见/近红外发光二元反射光栅:两种光刻技术的研究","authors":"M. Lee, J. Cholet, A. Delboulbé, R. Guillemet, B. Loiseaux, P. Garabédian, T. Flügel-Paul, T. Benkenstein, S. Sadlowski, N. Tetaz, R. Windpassinger, A. Baselga Mateo","doi":"10.1051/jeos/2023004","DOIUrl":null,"url":null,"abstract":"We report on subwavelength reflective gratings for hyperspectral applications operating in a very large spectral band (340 nm -1040 nm). Our study concerns a blazed-binary grating having a period of 30µm and composed of 2D subwavelength structures with size in between 120 nm and 350 nm. We demonstrate the manufacturing of the gratings on 3” wafers by two lithography technologies (e-beam and nanoimprint) followed by classical dry etching process. Optical measurements show that the subwavelength grating approach enables a broadband efficiency, polarization behaviour and wavefront quality improvement with respect to the requirements for the next generation of spectro-imagers for Earth observation missions. An outlook towards spherical substrate based on nanoimprint lithography is also reported with the results of mixed features replication (holes and pillars in the range of 160 nm to 330 nm) on a 540 mm concave which demonstrate uniformity and accuracy capabilities over 3” surface.","PeriodicalId":674,"journal":{"name":"Journal of the European Optical Society-Rapid Publications","volume":" ","pages":""},"PeriodicalIF":1.9000,"publicationDate":"2023-01-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Wide band UV/Vis/NIR blazed-binary reflective gratings for spectro-imagers: two lithographic technologies investigation\",\"authors\":\"M. Lee, J. Cholet, A. Delboulbé, R. Guillemet, B. Loiseaux, P. Garabédian, T. Flügel-Paul, T. Benkenstein, S. Sadlowski, N. Tetaz, R. Windpassinger, A. Baselga Mateo\",\"doi\":\"10.1051/jeos/2023004\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We report on subwavelength reflective gratings for hyperspectral applications operating in a very large spectral band (340 nm -1040 nm). Our study concerns a blazed-binary grating having a period of 30µm and composed of 2D subwavelength structures with size in between 120 nm and 350 nm. We demonstrate the manufacturing of the gratings on 3” wafers by two lithography technologies (e-beam and nanoimprint) followed by classical dry etching process. Optical measurements show that the subwavelength grating approach enables a broadband efficiency, polarization behaviour and wavefront quality improvement with respect to the requirements for the next generation of spectro-imagers for Earth observation missions. An outlook towards spherical substrate based on nanoimprint lithography is also reported with the results of mixed features replication (holes and pillars in the range of 160 nm to 330 nm) on a 540 mm concave which demonstrate uniformity and accuracy capabilities over 3” surface.\",\"PeriodicalId\":674,\"journal\":{\"name\":\"Journal of the European Optical Society-Rapid Publications\",\"volume\":\" \",\"pages\":\"\"},\"PeriodicalIF\":1.9000,\"publicationDate\":\"2023-01-12\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of the European Optical Society-Rapid Publications\",\"FirstCategoryId\":\"4\",\"ListUrlMain\":\"https://doi.org/10.1051/jeos/2023004\",\"RegionNum\":4,\"RegionCategory\":\"物理与天体物理\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"OPTICS\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of the European Optical Society-Rapid Publications","FirstCategoryId":"4","ListUrlMain":"https://doi.org/10.1051/jeos/2023004","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"OPTICS","Score":null,"Total":0}

引用次数: 0

摘要

我们报道了用于高光谱应用的亚波长反射光栅，工作在非常大的光谱带(340 nm -1040 nm)。我们的研究涉及一个周期为30µm的燃烧二元光栅，由尺寸在120 nm到350 nm之间的二维亚波长结构组成。我们演示了两种光刻技术(电子束和纳米压印)在3英寸晶圆上制造光栅，然后采用经典的干蚀刻工艺。光学测量表明，亚波长光栅方法能够提高宽带效率、偏振行为和波前质量，以满足下一代地球观测任务的光谱成像仪的要求。对基于纳米压印光刻技术的球形基板的展望也有报道，在540毫米凹面上复制混合特征(160纳米至330纳米范围内的孔和柱)的结果表明，在3英寸表面上具有均匀性和准确性。

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Wide band UV/Vis/NIR blazed-binary reflective gratings for spectro-imagers: two lithographic technologies investigation

We report on subwavelength reflective gratings for hyperspectral applications operating in a very large spectral band (340 nm -1040 nm). Our study concerns a blazed-binary grating having a period of 30µm and composed of 2D subwavelength structures with size in between 120 nm and 350 nm. We demonstrate the manufacturing of the gratings on 3” wafers by two lithography technologies (e-beam and nanoimprint) followed by classical dry etching process. Optical measurements show that the subwavelength grating approach enables a broadband efficiency, polarization behaviour and wavefront quality improvement with respect to the requirements for the next generation of spectro-imagers for Earth observation missions. An outlook towards spherical substrate based on nanoimprint lithography is also reported with the results of mixed features replication (holes and pillars in the range of 160 nm to 330 nm) on a 540 mm concave which demonstrate uniformity and accuracy capabilities over 3” surface.

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来源期刊

Journal of the European Optical Society-Rapid Publications 物理-光学

CiteScore

2.40

自引率

0.00%

发文量

审稿时长

5 weeks

期刊介绍： Rapid progress in optics and photonics has broadened its application enormously into many branches, including information and communication technology, security, sensing, bio- and medical sciences, healthcare and chemistry. Recent achievements in other sciences have allowed continual discovery of new natural mysteries and formulation of challenging goals for optics that require further development of modern concepts and running fundamental research. The Journal of the European Optical Society – Rapid Publications (JEOS:RP) aims to tackle all of the aforementioned points in the form of prompt, scientific, high-quality communications that report on the latest findings. It presents emerging technologies and outlining strategic goals in optics and photonics. The journal covers both fundamental and applied topics, including but not limited to: Classical and quantum optics Light/matter interaction Optical communication Micro- and nanooptics Nonlinear optical phenomena Optical materials Optical metrology Optical spectroscopy Colour research Nano and metamaterials Modern photonics technology Optical engineering, design and instrumentation Optical applications in bio-physics and medicine Interdisciplinary fields using photonics, such as in energy, climate change and cultural heritage The journal aims to provide readers with recent and important achievements in optics/photonics and, as its name suggests, it strives for the shortest possible publication time.