等离子体增强化学气相沉积气体分离膜的研究

Q4 Chemical Engineering

ASEAN Journal of Chemical Engineering Pub Date : 2019-10-24 DOI:10.22146/ajche.50874

M. Kyaw, S. Mori, N. Dugos, S. Roces, A. Beltran, Shunsuke Suzuki

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引用次数: 2

摘要

采用低温等离子体增强化学气相沉积(PECVD)技术在沸石5A衬底上制备了聚茚二酮(PIn)膜。通过扫描电镜(SEM)和红外光谱(FT-IR)对膜进行了表征，在等离子体衍生的PIn膜中发现了新的峰。通过检测纯气体(H2、N2和CO2)通过膜的渗透性来分析膜的性能。pecvd衍生的PIn膜具有良好的气体阻隔性能，室温下对H2/CO2和H2/N2的选择性分别为8.2和4.0

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Plasma-Enhanced Chemical Vapor Deposition of Indene for Gas Separation Membrane

Polyindene (PIn) membrane was fabricated onto a zeolite 5A substrate by using plasma-enhanced chemical vapor deposition (PECVD) at low temperature. Membrane characterization was done by taking Scanning Electron Microscopy (SEM) and FT-IR measurements and the new peak was found in the plasma-derived PIn film. Membrane performance was analyzed by checking permeability of pure gases (H2, N2, and CO2) through the membrane. PECVD-derived PIn membrane showed high gas barrier properties and selectivities of 8.2 and 4.0 for H2/CO2 and H2/N2, respectively, at room temperature

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来源期刊

ASEAN Journal of Chemical Engineering Chemical Engineering-Chemical Engineering (all)

CiteScore

1.00

自引率

0.00%

发文量