自旋/浸渍镀膜与CVD相结合制备过渡金属二硫化物WS2薄膜

IF 1.1 4区 材料科学 Q4 MATERIALS SCIENCE, MULTIDISCIPLINARY
Woon-Seop Choi
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引用次数: 0

摘要

近年来,具有2D结构的过渡金属二硫族化合物(TMDCs)由于其许多独特的光学和电学性质而引起了人们的兴趣。2D材料的主要制备方法是化学气相沉积(CVD)、剥离和其他真空技术。由于钨基前体需要更高的温度,通过溶液工艺大规模合成WS2是罕见的。近年来,人们研究了将旋涂或浸涂与CVD相结合来制备具有良好电学性能的大面积2D TMDC。在这里,我们报道了一种将溶液涂层和CVD工艺相结合的大WS2晶体的新合成路线。通过浸渍和旋涂将钨酸钠和水合肼与硫代硫酸钠的溶液涂覆在硅片上。然后在不同的位置和温度下用CVD处理膜以促进结晶。对双涂层条件和CVD参数进行了改进,得到了WS2晶体。在900℃以上简单退火,无需气体处理,即可获得44±4µm的三角形WS2晶体。拉曼和原子力显微镜分析证实,合成的WS2是呈三角形的块状。在早期结晶阶段观察到WS2在643nm处的PL峰。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Transition Metal Dichalcogenide WS2 Films Prepared with a Combination of Spin/Dip Coating and CVD
Recently, transition metal dichalcogenides (TMDCs) with 2D structure have attracted interest due to their many unique optical and electrical properties. The primary preparation methods for 2D materials are chemical vapor deposition (CVD), exfoliation, and other vacuum technologies. Large-scale synthesis of WS2 via solution-process is rare due to the higher temperature needed for tungsten-based precursors. Combination of spin coating or dip coating with CVD have been studied recently to make large-area 2D TMDC with good electrical properties. Here, we report a new synthetic route for large WS2 crystal that combined solution coatings and CVD process. A solution of sodium tungstate and hydrazine hydrate with sodium thiosulphate was coated on a silicon wafer via dip and spin coating. The films were then treated with CVD at various positions and temperatures to facilitate crystallization. The double coating conditions and CVD parameters were modified to obtain WS2 crystals. Triangular shaped 44 ± 4 µm WS2 crystals could be obtained with simple annealing above 900oC without gas treatment. The synthesized WS2 was found to be bulk with a triangular shape, as confirmed by Raman and AFM analyses. A PL peak of WS2 at 643 nm was observed at an early crystallization stage.
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来源期刊
Korean Journal of Metals and Materials
Korean Journal of Metals and Materials MATERIALS SCIENCE, MULTIDISCIPLINARY-METALLURGY & METALLURGICAL ENGINEERING
CiteScore
1.80
自引率
58.30%
发文量
100
审稿时长
4-8 weeks
期刊介绍: The Korean Journal of Metals and Materials is a representative Korean-language journal of the Korean Institute of Metals and Materials (KIM); it publishes domestic and foreign academic papers related to metals and materials, in abroad range of fields from metals and materials to nano-materials, biomaterials, functional materials, energy materials, and new materials, and its official ISO designation is Korean J. Met. Mater.
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