用数值模拟评价氙短弧灯中钨蒸气行为

Q4 Engineering
S. Maenaka, S. Tashiro, A. Murphy, K. Fujita, Manabu Tanaka
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引用次数: 1

摘要

本研究建立了统一的数值模拟模型。在氙短弧灯电磁和热流体数值模拟模型中加入了辐射传热和钨蒸发的子模型,包括输运和吸附。然后,对钨气熏黑工艺进行了研究。当阳极的温度在熔点附近时,蒸发的热损失相对于输入功率很小。很明显,在阳极上几乎没有热影响。此外,在数值模拟中,气相沉积的通量很高,从而证实了灯的变黑。此外,还确定了钨蒸气发黑的工艺。该数值模拟模型可用于电弧流控制和发黑的研究。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Evaluation of Tungsten Vapor Behavior in Xenon Short Arc Lamp Using Numerical Simulation
In this study, a unified numerical simulation model was developed. A sub model of radiative heat transfer and tungsten evaporation, including transportation and adhesion, was added to an electromagnetic and thermal fl uid numerical simulation model of a xenon short arc lamp. Then, the process of blackening by tungsten vapor was studied. When the temperature of the anode is around melting point, the heat loss of the evaporation against the input power is small. It is clear that there is almost no thermal in fl uence on the anode. In addition, the fl ux of vapor deposition in this numerical simulation is high, then the blackening of the lamp was con fi rmed. Furthermore, the process of blackening by tungsten vapor was also con fi rmed. This numerical simulation model is shown to be useful for the examination of arc fl ow control and blackening.
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来源期刊
Journal of the Illuminating Engineering Institute of Japan (Shomei Gakkai Shi)
Journal of the Illuminating Engineering Institute of Japan (Shomei Gakkai Shi) Engineering-Electrical and Electronic Engineering
CiteScore
0.10
自引率
0.00%
发文量
6
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