近紫外光辅助l-抗坏血酸还原氧化石墨烯薄膜

IF 4.5 3区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY
J. Regis, Sebastian Vargas, Andrea Irigoyen, Elsa Bramasco-Rivera, J. Bañuelos, Luis Delfin, A. Renteria, Ulises Martinez, T. Rockward, Yirong Lin
{"title":"近紫外光辅助l-抗坏血酸还原氧化石墨烯薄膜","authors":"J. Regis, Sebastian Vargas, Andrea Irigoyen, Elsa Bramasco-Rivera, J. Bañuelos, Luis Delfin, A. Renteria, Ulises Martinez, T. Rockward, Yirong Lin","doi":"10.1080/19475411.2021.1887396","DOIUrl":null,"url":null,"abstract":"ABSTRACT Recent studies have highlighted the effects of various stimuli on the chemical reduction of graphene oxide (GO) through green reductant L-ascorbic acid (L-AA); however, the combination of near ultraviolet (NUV) light to increase the reduction rate has yet to be thoroughly explored. In this study, drop-casted GO films were subjected to chemical reduction through L-AA with various levels of exposure under 405 nm NUV radiation. The structure and uniformity of GO stackings that form the film were characterized through scanning electron microscopy (SEM) and wide-angle x-ray scattering (WAXS). Additionally, WAXS was used to track the removal of oxygen-containing functional groups along with Fourier-transform infrared (FT-IR) spectroscopy and x-ray photoelectron spectroscopy (XPS) as a function of L-AA and NUV light exposure times. XPS results demonstrated that the interaction between L-AA and NUV exposure has a significant effect on the reduction of films. Furthermore, the results that yielded the highest reduction (C-C bond concentration of 60.7%) were the longest L-AA and NUV light exposure times (48 hours and 3 hours, respectively). This report provides a study on the effects of NUV on the green reduction of GO films through L-AA with potential application in solar energy and chemical sensing applications. Graphical abstract","PeriodicalId":48516,"journal":{"name":"International Journal of Smart and Nano Materials","volume":"12 1","pages":"20 - 35"},"PeriodicalIF":4.5000,"publicationDate":"2021-01-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1080/19475411.2021.1887396","citationCount":"7","resultStr":"{\"title\":\"Near-UV light assisted green reduction of graphene oxide films through l-ascorbic acid\",\"authors\":\"J. Regis, Sebastian Vargas, Andrea Irigoyen, Elsa Bramasco-Rivera, J. Bañuelos, Luis Delfin, A. Renteria, Ulises Martinez, T. Rockward, Yirong Lin\",\"doi\":\"10.1080/19475411.2021.1887396\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"ABSTRACT Recent studies have highlighted the effects of various stimuli on the chemical reduction of graphene oxide (GO) through green reductant L-ascorbic acid (L-AA); however, the combination of near ultraviolet (NUV) light to increase the reduction rate has yet to be thoroughly explored. In this study, drop-casted GO films were subjected to chemical reduction through L-AA with various levels of exposure under 405 nm NUV radiation. The structure and uniformity of GO stackings that form the film were characterized through scanning electron microscopy (SEM) and wide-angle x-ray scattering (WAXS). Additionally, WAXS was used to track the removal of oxygen-containing functional groups along with Fourier-transform infrared (FT-IR) spectroscopy and x-ray photoelectron spectroscopy (XPS) as a function of L-AA and NUV light exposure times. XPS results demonstrated that the interaction between L-AA and NUV exposure has a significant effect on the reduction of films. Furthermore, the results that yielded the highest reduction (C-C bond concentration of 60.7%) were the longest L-AA and NUV light exposure times (48 hours and 3 hours, respectively). This report provides a study on the effects of NUV on the green reduction of GO films through L-AA with potential application in solar energy and chemical sensing applications. Graphical abstract\",\"PeriodicalId\":48516,\"journal\":{\"name\":\"International Journal of Smart and Nano Materials\",\"volume\":\"12 1\",\"pages\":\"20 - 35\"},\"PeriodicalIF\":4.5000,\"publicationDate\":\"2021-01-02\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://sci-hub-pdf.com/10.1080/19475411.2021.1887396\",\"citationCount\":\"7\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"International Journal of Smart and Nano Materials\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://doi.org/10.1080/19475411.2021.1887396\",\"RegionNum\":3,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"MATERIALS SCIENCE, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Journal of Smart and Nano Materials","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.1080/19475411.2021.1887396","RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 7

摘要

摘要最近的研究强调了各种刺激对绿色还原剂L-抗坏血酸(L-AA)化学还原氧化石墨烯(GO)的影响;然而,结合近紫外线(NUV)光来提高还原率还有待彻底探索。在本研究中,在405nm NUV辐射下,通过L-AA对滴铸GO膜进行不同暴露水平的化学还原。通过扫描电子显微镜(SEM)和广角x射线散射(WAXS)对形成薄膜的GO堆叠的结构和均匀性进行了表征。此外,WAXS用于跟踪含氧官能团的去除,以及作为L-AA和NUV光暴露时间的函数的傅立叶变换红外(FT-IR)光谱和x射线光电子能谱(XPS)。XPS结果表明,L-AA和NUV的相互作用对薄膜的还原有显著影响。此外,产生最高还原(C-C键浓度为60.7%)的结果是最长的L-AA和NUV光暴露时间(分别为48小时和3小时)。本报告研究了NUV通过L-AA对GO薄膜绿色还原的影响,在太阳能和化学传感应用中具有潜在的应用前景。图形摘要
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Near-UV light assisted green reduction of graphene oxide films through l-ascorbic acid
ABSTRACT Recent studies have highlighted the effects of various stimuli on the chemical reduction of graphene oxide (GO) through green reductant L-ascorbic acid (L-AA); however, the combination of near ultraviolet (NUV) light to increase the reduction rate has yet to be thoroughly explored. In this study, drop-casted GO films were subjected to chemical reduction through L-AA with various levels of exposure under 405 nm NUV radiation. The structure and uniformity of GO stackings that form the film were characterized through scanning electron microscopy (SEM) and wide-angle x-ray scattering (WAXS). Additionally, WAXS was used to track the removal of oxygen-containing functional groups along with Fourier-transform infrared (FT-IR) spectroscopy and x-ray photoelectron spectroscopy (XPS) as a function of L-AA and NUV light exposure times. XPS results demonstrated that the interaction between L-AA and NUV exposure has a significant effect on the reduction of films. Furthermore, the results that yielded the highest reduction (C-C bond concentration of 60.7%) were the longest L-AA and NUV light exposure times (48 hours and 3 hours, respectively). This report provides a study on the effects of NUV on the green reduction of GO films through L-AA with potential application in solar energy and chemical sensing applications. Graphical abstract
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
International Journal of Smart and Nano Materials
International Journal of Smart and Nano Materials MATERIALS SCIENCE, MULTIDISCIPLINARY-
CiteScore
6.30
自引率
5.10%
发文量
39
审稿时长
11 weeks
期刊介绍: The central aim of International Journal of Smart and Nano Materials is to publish original results, critical reviews, technical discussion, and book reviews related to this compelling research field: smart and nano materials, and their applications. The papers published in this journal will provide cutting edge information and instructive research guidance, encouraging more scientists to make their contribution to this dynamic research field.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信