用于调q脉冲产生的Ti3SiC2 Max相材料

Pub Date : 2023-07-13 DOI:10.1007/s10946-023-10134-w
M. A. A. B. Sahib, Rozalina Zakaria, Nur Farhana Zulkipli, Ahmad H. A. Rosol, Moh Yasin, Sulaiman Wadi Harun
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引用次数: 0

摘要

我们报道了Ti3SiC2 MAX相材料作为1550nm区域调q脉冲产生吸收剂的可行性。将Ti3SiC2颗粒包埋在聚乙烯醇(PVA)薄膜中,并通过夹层结构的光纤卡套平台将其引入掺铒光纤激光器(EDFL)腔中,制备了饱和吸收材料。在1550 nm区域,SA薄膜的线性吸收为3.8 dB,调制深度为51%。在EDFL环形腔内使用基于Ti3SiC2/PVA薄膜的SA,在1561.8 nm波长处实现了自启动和稳定的调q脉冲序列。在71.5 mW的泵浦功率下,最大脉冲能量为1007 nJ,最大重复频率为43.5 kHz,最小脉冲宽度为5.6 μs。这一结果揭示了Ti3SiC2 MAX相材料在1550nm区域作为低成本和实用的脉冲产生SA的潜力。
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The Ti3SiC2 Max Phase Material for Q-Switched Pulse Generation

We report the feasibility of a Ti3SiC2 MAX phase material as absorber for Q-switched pulse generation in the 1550 nm region. The proposed saturable absorber (SA) is fabricated by embedding Ti3SiC2 particles into polyvinyl alcohol (PVA) thin film and incorporated into Erbium-doped fiber laser (EDFL) cavity via a sandwich-structured fiber-ferrule platform. The SA thin film exhibits a linear absorption of 3.8 dB and a modulation depth of 51% in the 1550 nm region. Using the Ti3SiC2/PVA thin filmbased SA within an EDFL ring cavity, a self-started and stable Q-switched pulse train is achieved at a wavelength of 1561.8 nm. It exhibits a maximum pulse energy of 100.7 nJ, a maximum repetition rate of 43.5 kHz, and a minimum pulse width of 5.6 μs at a pump power of 71.5 mW. This result unveils the potential of Ti3SiC2 MAX phase material for use as a low-cost and practical SA for pulse generation in the 1550 nm region.

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