M. T. Normuradov, Sh. T. Khozhiev, K. Dovranov, Kh.T. Davranov, M. Davlatov, F. K. Khollokov
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Development of Technology for Obtaining Nanosized Heterostructured Films by Ion-Plasma Deposition
The study of films containing narrow-gap semiconductors is a very promising field related to the production of thermal sensors. In this work, we consider the possibility of obtaining the film coatings from silicides of Ba, Na, Ni, Co, Pd, Mn, and P and BaTiO3 using ionplasma methods. The production of film coatings from metal silicides and BaTiO3 on the surface of crystalline silicon and mica and their electronic and X-ray structural characteristics are studied. The dependence of the properties of film coatings on the conditions of the film deposition is determined.
期刊介绍:
Ukrainian Journal of Physics is the general physics edition of the Department of Physics and Astronomy of the National Academy of Sciences of Ukraine. The journal publishes original papers and reviews in the fields of experimental and theoretical physics.