高纯锗单晶的制备及位错密度分析

Q4 Engineering
Xin Hao, Lin Gan, Shipeng Hu, Q. Luo, Zhengxin Wu, Jian Zhong, Haige Zhao, Huibin Sun
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引用次数: 0

摘要

摘要:高纯锗探测器在辐射探测领域占有重要地位。通过区熔提纯和单晶生长,成功制备了纯度为13N,位错密度在100 ~ 10 000 cm-2之间的高纯锗。在区域熔炼实验中,采用自制卧式区域炉,在高纯氢气环境下,经过20 ~ 50次区域熔炼,达到净化要求。采用Czochralski法在高纯氢环境下沿[100]方向生长单晶,有效长> 50 mm,有效直径> 30 mm。位错密度测量采用蚀刻法。采用酸性蚀刻液对晶体(100)表面进行蚀刻,并对蚀刻坑的个数进行计数。结果表明:在距单晶头部25、50和72 mm处,位错密度分别为2 537、3 425和4 075 cm-2;这些结果表明,72 mm之前的位错密度满足制备高纯度锗探测器的要求。研究结果可为制备高纯锗单晶提供参考。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Preparation of high purity germanium single crystal and analysis of dislocation density
Abstract: High purity germanium detector plays an important role in the field of radiation detection. High purity germanium with 13N purity and dislocation density between 100 ~ 10 000 cm-2 was successfully prepared through zone melting purification and single crystal growth. In the zone melting experiment, the self-made horizontal zone furnace is used to achieve the purification requirements through 20 ~ 50 times of zone melting in the environment of high-purity hydrogen. The single crystal is grown by Czochralski method along the [100] direction in high-purity hydrogen environment with effective length > 50 mm and effective diameter > 30 mm. The dislocation density measurement adopts the etching method. The acid etching solution is used to etch the crystal (100) surface and the number of the etch pits is counted. The results show that the dislocation densities at 25, 50 and 72 mm from the head of the single crystal are 2 537, 3 425 and 4 075 cm-2 respectively. These results indicate that the dislocation density before 72 mm meets the requirements for the preparation of high-purity germanium detectors. The research can provide reference for the preparation of high purity germanium single crystal.
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来源期刊
CiteScore
0.90
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14
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