喷雾热解法研究介电基片上cu薄膜的光学、结构和电学性能

IF 0.5 Q4 PHYSICS, MULTIDISCIPLINARY
{"title":"喷雾热解法研究介电基片上cu薄膜的光学、结构和电学性能","authors":"","doi":"10.47011/15.1.7","DOIUrl":null,"url":null,"abstract":"Abstract: This paper deals with depositing a CuS thin film on a glass substrate at 3800C by using spray pyrolysis method. Its optical properties and electric properties are characterized after cooling the sample. Formation for compound, structure and morphology were studied using x-ray diffraction. The optical study comprised the extraction and analysis of calculated optical constants, such as absorption coefficient (α), transmittance, extinction coefficient (k), which revealed the presence of a direct optical energy band gap of 2.0 eV. The temperature-dependent electrical resistivity with other necessary parameters was systematically studied for CuS film in the present work. Overall study confirmed the semiconducting behavior of the film which is useful for many applications, even when the film is touching the substrate at a micrometer scale with spray pyrolysis. This paper also explores the optical conductivity, dielectric constant, Urbach energy, morphology and thermal activation energy of the CuS film with explaining methodological details.\nKeywords: Thin film, Spray pyrolysis technique, Electrical and optical properties, XRD.","PeriodicalId":42562,"journal":{"name":"Jordan Journal of Physics","volume":" ","pages":""},"PeriodicalIF":0.5000,"publicationDate":"2022-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Optical, Structural and Electrical Properties of CuS Thin Film on Dielectric Substrate by Spray Pyrolysis Technique\",\"authors\":\"\",\"doi\":\"10.47011/15.1.7\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Abstract: This paper deals with depositing a CuS thin film on a glass substrate at 3800C by using spray pyrolysis method. Its optical properties and electric properties are characterized after cooling the sample. Formation for compound, structure and morphology were studied using x-ray diffraction. The optical study comprised the extraction and analysis of calculated optical constants, such as absorption coefficient (α), transmittance, extinction coefficient (k), which revealed the presence of a direct optical energy band gap of 2.0 eV. The temperature-dependent electrical resistivity with other necessary parameters was systematically studied for CuS film in the present work. Overall study confirmed the semiconducting behavior of the film which is useful for many applications, even when the film is touching the substrate at a micrometer scale with spray pyrolysis. This paper also explores the optical conductivity, dielectric constant, Urbach energy, morphology and thermal activation energy of the CuS film with explaining methodological details.\\nKeywords: Thin film, Spray pyrolysis technique, Electrical and optical properties, XRD.\",\"PeriodicalId\":42562,\"journal\":{\"name\":\"Jordan Journal of Physics\",\"volume\":\" \",\"pages\":\"\"},\"PeriodicalIF\":0.5000,\"publicationDate\":\"2022-03-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Jordan Journal of Physics\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.47011/15.1.7\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q4\",\"JCRName\":\"PHYSICS, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Jordan Journal of Physics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.47011/15.1.7","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"PHYSICS, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 2

摘要

文摘:本文采用喷雾热解法在3800℃的温度下在玻璃衬底上沉积了CuS薄膜。冷却样品后,对其光学性能和电学性能进行了表征。利用x射线衍射研究了化合物的形成、结构和形貌。光学研究包括提取和分析计算的光学常数,如吸收系数(α)、透射率、消光系数(k),揭示了2.0eV的直接光学能带隙的存在。本工作系统地研究了CuS膜的温度相关电阻率和其他必要参数。总体研究证实了薄膜的半导体行为,这对许多应用都是有用的,即使当薄膜在微米尺度上通过喷雾热解接触基底时也是如此。本文还探讨了CuS膜的光学电导率、介电常数、Urbach能、形貌和热活化能,并对方法细节进行了解释。关键词:薄膜;喷雾热解技术;电学和光学性能;XRD。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Optical, Structural and Electrical Properties of CuS Thin Film on Dielectric Substrate by Spray Pyrolysis Technique
Abstract: This paper deals with depositing a CuS thin film on a glass substrate at 3800C by using spray pyrolysis method. Its optical properties and electric properties are characterized after cooling the sample. Formation for compound, structure and morphology were studied using x-ray diffraction. The optical study comprised the extraction and analysis of calculated optical constants, such as absorption coefficient (α), transmittance, extinction coefficient (k), which revealed the presence of a direct optical energy band gap of 2.0 eV. The temperature-dependent electrical resistivity with other necessary parameters was systematically studied for CuS film in the present work. Overall study confirmed the semiconducting behavior of the film which is useful for many applications, even when the film is touching the substrate at a micrometer scale with spray pyrolysis. This paper also explores the optical conductivity, dielectric constant, Urbach energy, morphology and thermal activation energy of the CuS film with explaining methodological details. Keywords: Thin film, Spray pyrolysis technique, Electrical and optical properties, XRD.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
Jordan Journal of Physics
Jordan Journal of Physics PHYSICS, MULTIDISCIPLINARY-
CiteScore
0.90
自引率
14.30%
发文量
38
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信