二维数值模拟研究衬底对n-ZnO/p-Si结构光伏性能的影响

IF 1.1 4区 物理与天体物理 Q4 NANOSCIENCE & NANOTECHNOLOGY
M. Manoua, A. Bouajaj, A. Almaggoussi, N. Kamoun, A. Liba
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引用次数: 0

摘要

摘要硅(Si)和氧化锌(ZnO)基异质结是有望提供良好光子性能的光电子器件。n-ZnO  /  利用ATLAS-Silvaco软件对p-Si结构进行了二维数值模拟。研究了p-Si衬底的厚度、受主浓度和少数载流子寿命等参数对n-ZnO光子性能的影响  /  p-Si异质结,考虑了ZnO发射极层中的界面状态和缺陷。模拟结果表明,允许更好的光子性能的最佳参数是p-Si厚度为250  μm,受体浓度为6  ×  1015  厘米  −  3,少数载流子寿命为10  −  3.  s.获得的光伏参数为JSC的短路电流密度  =  38.9  毫安  /  cm2,VOC开路电压  =  0.54  V、 FF的填充系数  =  59  %  , 和η的转换效率  =  12.36  %  .
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Substrate effects investigation on photovoltaic properties of n-ZnO/p-Si structure using two-dimensional numerical simulation
Abstract. Silicon (Si) and zinc oxide (ZnO)-based heterojunctions are optoelectronic devices that promise to provide good photonic performance. The n-ZnO  /  p-Si structure is investigated using two-dimensional numerical simulation by ATLAS Silvaco software. This study investigated the effects of p-Si substrate parameters, such as thickness, acceptor concentration, and minority carrier lifetime, on the photonic performances of n-ZnO  /  p-Si heterojunction, taking into account the interface states and defects in the ZnO emitter layer for a real simulated structure. The simulation results showed that the optimal parameters that allow for better photonic performance are a p-Si thickness of 250  μm, an acceptor concentration of 6  ×  1015  cm  −  3, and a minority carrier lifetime of 10  −  3  s. The obtained photovoltaic parameters are short circuit current density of JSC  =  38.9  mA  /  cm2, open circuit voltage of VOC  =  0.54  V, fill factor (FF) of FF  =  59  %  , and conversion efficiency of η  =  12.36  %  .
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来源期刊
Journal of Nanophotonics
Journal of Nanophotonics 工程技术-光学
CiteScore
2.60
自引率
6.70%
发文量
42
审稿时长
3 months
期刊介绍: The Journal of Nanophotonics publishes peer-reviewed papers focusing on the fabrication and application of nanostructures that facilitate the generation, propagation, manipulation, and detection of light from the infrared to the ultraviolet regimes.
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