纵向磁场对空心螺柱电弧运动及接头结构的影响

IF 1.3 4区 材料科学 Q4 MATERIALS SCIENCE, MULTIDISCIPLINARY
Deku Zhang, Mengyu Duan, Xinkai Zhu, Hongyu Zhang, Chonglin Wu, Kehong Wang
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引用次数: 1

摘要

针对大直径空心螺柱焊中接头端面熔化不均匀和接头局部不熔合的问题,研究了纵向磁场推动空心螺柱焊过程中电弧运动规律、接头成形质量、焊缝显微组织和力学性能。结果表明:在纵向磁场的作用下,螺柱末端的圆弧受到洛伦兹力的影响,呈螺旋向下运动;在焊接过程中,随着磁场强度的增加,电弧均匀地烧伤螺柱端面,防止了局部不熔合,形成了形状良好的接头。在磁场搅拌作用下,共晶铁氧体破碎,共晶铁氧体和贝氏体含量减少,形核屏障减少,晶粒细化。在纵向磁场作用下,空心螺柱焊接接头的抗剪强度提高到312 MPa,超过了无磁场焊接接头的抗剪强度。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Effect of longitudinal magnetic field on arc motion and joint structure of hollow stud
Given the non-uniform melting of the end face of the joint and the local non-fusion of the joint in large-diameter hollow stud welding, to research the law of arc motion, the joint forming quality, the weld microstructure and mechanical properties, in the process of hollow stud welding propelled by the longitudinal magnetic field in this paper. The results reveal that under the influence of the longitudinal magnetic field, the arc on the end of stud is affected by Lorentz force and spirals downward. In the welding process, with the increase of magnetic field intensity, the arc uniformly burns the stud end face, preventing local non-fusion and resulting in a well-shaped joint. Under the action of magnetic field stirring, the eutectoid ferrite is broken, the content of eutectoid ferrite and bainite is diminished, the nucleation barrier is reduced and the grain is refined. Under the action of the longitudinal magnetic field, the shear strength of the hollow stud welded joint is raised to 312 MPa, surpassing the strength of a joint welded without a magnetic field.
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来源期刊
Emerging Materials Research
Emerging Materials Research MATERIALS SCIENCE, MULTIDISCIPLINARY-
CiteScore
4.50
自引率
9.10%
发文量
62
期刊介绍: Materials Research is constantly evolving and correlations between process, structure, properties and performance which are application specific require expert understanding at the macro-, micro- and nano-scale. The ability to intelligently manipulate material properties and tailor them for desired applications is of constant interest and challenge within universities, national labs and industry.
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