半导体工业x射线计量教程。

IF 1.3 4区工程技术 Q3 INSTRUMENTS & INSTRUMENTATION

Journal of Research of the National Institute of Standards and Technology Pub Date : 2019-02-01 DOI:10.1002/HTTPS://DOI.ORG/10.6028/JRES.124.003

D. Sunday, Wen-Li Wu, S. Barton, R. Joseph Kline

{"title":"半导体工业x射线计量教程。","authors":"D. Sunday, Wen-Li Wu, S. Barton, R. Joseph Kline","doi":"10.1002/HTTPS://DOI.ORG/10.6028/JRES.124.003","DOIUrl":null,"url":null,"abstract":"The semiconductor industry is in need of new, in-line dimensional metrology\n methods with higherspatial resolution for characterizing their next generation\n nanodevices. The purpose of this short course is to train the semiconductor industry\n on the NIST-developed critical dimension small angle X-ray scattering (CDSAXS)\n method. The topics will include both data processing and instrumentation. The short\n course will also provide an opportunity for discussion of the requirements for\n CDSAXS and the necessary improvements in X-ray source technology. Expected audience\n include semiconductor manufacturers, equipment manufacturers, and component\n manufacturers. The presentations were made at “X-ray Metrology for the Semiconductor\n Industry” short course at the National Institute of Standards and Technology on Aug.\n 25, 2016.","PeriodicalId":54766,"journal":{"name":"Journal of Research of the National Institute of Standards and Technology","volume":"124 1","pages":"1-3"},"PeriodicalIF":1.3000,"publicationDate":"2019-02-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"X-ray Metrology for the Semiconductor Industry Tutorial.\",\"authors\":\"D. Sunday, Wen-Li Wu, S. Barton, R. Joseph Kline\",\"doi\":\"10.1002/HTTPS://DOI.ORG/10.6028/JRES.124.003\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The semiconductor industry is in need of new, in-line dimensional metrology\\n methods with higherspatial resolution for characterizing their next generation\\n nanodevices. The purpose of this short course is to train the semiconductor industry\\n on the NIST-developed critical dimension small angle X-ray scattering (CDSAXS)\\n method. The topics will include both data processing and instrumentation. The short\\n course will also provide an opportunity for discussion of the requirements for\\n CDSAXS and the necessary improvements in X-ray source technology. Expected audience\\n include semiconductor manufacturers, equipment manufacturers, and component\\n manufacturers. The presentations were made at “X-ray Metrology for the Semiconductor\\n Industry” short course at the National Institute of Standards and Technology on Aug.\\n 25, 2016.\",\"PeriodicalId\":54766,\"journal\":{\"name\":\"Journal of Research of the National Institute of Standards and Technology\",\"volume\":\"124 1\",\"pages\":\"1-3\"},\"PeriodicalIF\":1.3000,\"publicationDate\":\"2019-02-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Research of the National Institute of Standards and Technology\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://doi.org/10.1002/HTTPS://DOI.ORG/10.6028/JRES.124.003\",\"RegionNum\":4,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"INSTRUMENTS & INSTRUMENTATION\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Research of the National Institute of Standards and Technology","FirstCategoryId":"5","ListUrlMain":"https://doi.org/10.1002/HTTPS://DOI.ORG/10.6028/JRES.124.003","RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"INSTRUMENTS & INSTRUMENTATION","Score":null,"Total":0}

引用次数: 1

摘要

半导体工业需要新的、具有更高空间分辨率的在线尺寸测量方法来表征他们的下一代纳米器件。这个短期课程的目的是培训半导体行业对nist开发的临界尺寸小角度x射线散射(CDSAXS)方法。主题将包括数据处理和仪器。短期课程还将为讨论CDSAXS的要求和x射线源技术的必要改进提供机会。预期读者包括半导体制造商、设备制造商和元件制造商。该报告于2016年8月25日在美国国家标准与技术研究院举办的“半导体行业x射线计量”短期课程上发表。

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X-ray Metrology for the Semiconductor Industry Tutorial.

The semiconductor industry is in need of new, in-line dimensional metrology methods with higherspatial resolution for characterizing their next generation nanodevices. The purpose of this short course is to train the semiconductor industry on the NIST-developed critical dimension small angle X-ray scattering (CDSAXS) method. The topics will include both data processing and instrumentation. The short course will also provide an opportunity for discussion of the requirements for CDSAXS and the necessary improvements in X-ray source technology. Expected audience include semiconductor manufacturers, equipment manufacturers, and component manufacturers. The presentations were made at “X-ray Metrology for the Semiconductor Industry” short course at the National Institute of Standards and Technology on Aug. 25, 2016.

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来源期刊

Journal of Research of the National Institute of Standards and Technology 工程技术-物理：应用

自引率

33.30%

发文量

审稿时长

>12 weeks

期刊介绍： The Journal of Research of the National Institute of Standards and Technology is the flagship publication of the National Institute of Standards and Technology. It has been published under various titles and forms since 1904, with its roots as Scientific Papers issued as the Bulletin of the Bureau of Standards. In 1928, the Scientific Papers were combined with Technologic Papers, which reported results of investigations of material and methods of testing. This new publication was titled the Bureau of Standards Journal of Research. The Journal of Research of NIST reports NIST research and development in metrology and related fields of physical science, engineering, applied mathematics, statistics, biotechnology, information technology.