单色光和温度下n+-p-p+硅太阳能电池交流背表面复合速度

Mame Faty Mbaye Fall, I. Gaye, D. Diarisso, G. Diop, Khady Loum, Nafy Diop, Khalidou Mamadou Sy, M. Ndiaye, G. Sissoko
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引用次数: 3

摘要

研究了单色照度调频下单面硅太阳电池基底中过量少数载流子的扩散方程。利用涉及复合速度Sf和Sb的基限条件,分别在结(n+/p)和背表面(p+/p)处,确定了过量少数载流子密度δ (T, ω)的交流表达式。在不同温度下,光电流的交流密度Jph (T, ω)随结处复合速度的变化而变化。推导了少数载流子交流背表面复合速度Sb的表达式,该表达式与调制频率、温度、电子参数D (ω)和基材厚度有关。用波德图和奈奎斯特图来分析它。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
AC Back Surface Recombination Velocity in n+-p-p+ Silicon Solar Cell under Monochromatic Light and Temperature
Excess minority carrier’s diffusion equation in the base of monofaciale silicon solar cell under frequency modulation of monochromatic illumination is resolved. Using conditions at the base limits involving recombination velocities Sf and Sb, respectively at the junction (n+/p) and back surface (p+/p), the AC expression of the excess minority carriers’ density δ (T, ω) is determined. The AC density of photocurrent Jph (T, ω) is represented versus recombination velocity at the junction for different values of the temperature. The expression of the AC back surface recombination velocity Sb of minority carriers is deduced depending on the frequency of modulation, temperature, the electronic parameters (D (ω)) and the thickness of the base. Bode and Nyquist diagrams are used to analyze it.
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