{"title":"微波辅助等离子体在不同输入功率下的建模与仿真","authors":"E. Poorreza, N. Dadashzadeh Gargari","doi":"10.1134/S1990793123030235","DOIUrl":null,"url":null,"abstract":"<p>Plasma technology is used in various fields such as ozone generation, surface treatment, medicine and so on. Wave generated plasmas such as microwave plasma, is a promising technology for its interesting and versatile features. These features of microwave plasma are an alternative technology compared to traditional thermal chemical reactors provided certain technical challenges are overcome. In this numerical study, the properties of microwave-powered plasma operated at frequency of 2.45 GHz and in argon gas at atmospheric pressure were investigated. By varying the input power of the device in transvers magnetic (TM) mode, the comparative profiles of the electron density, the electron temperature, the electric field and the power deposition are demonstrated. Simulation results show chemical generation in microwave plasma. High energy electrons and electron density have been considered to be the main factors affecting microwave plasma properties.</p>","PeriodicalId":768,"journal":{"name":"Russian Journal of Physical Chemistry B","volume":"17 3","pages":"719 - 724"},"PeriodicalIF":1.4000,"publicationDate":"2023-07-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Modeling and Simulation of a Microwave-Assisted Plasma with Different Input Power for Plasma-Based Applications\",\"authors\":\"E. Poorreza, N. Dadashzadeh Gargari\",\"doi\":\"10.1134/S1990793123030235\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<p>Plasma technology is used in various fields such as ozone generation, surface treatment, medicine and so on. Wave generated plasmas such as microwave plasma, is a promising technology for its interesting and versatile features. These features of microwave plasma are an alternative technology compared to traditional thermal chemical reactors provided certain technical challenges are overcome. In this numerical study, the properties of microwave-powered plasma operated at frequency of 2.45 GHz and in argon gas at atmospheric pressure were investigated. By varying the input power of the device in transvers magnetic (TM) mode, the comparative profiles of the electron density, the electron temperature, the electric field and the power deposition are demonstrated. Simulation results show chemical generation in microwave plasma. High energy electrons and electron density have been considered to be the main factors affecting microwave plasma properties.</p>\",\"PeriodicalId\":768,\"journal\":{\"name\":\"Russian Journal of Physical Chemistry B\",\"volume\":\"17 3\",\"pages\":\"719 - 724\"},\"PeriodicalIF\":1.4000,\"publicationDate\":\"2023-07-30\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Russian Journal of Physical Chemistry B\",\"FirstCategoryId\":\"92\",\"ListUrlMain\":\"https://link.springer.com/article/10.1134/S1990793123030235\",\"RegionNum\":4,\"RegionCategory\":\"化学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q4\",\"JCRName\":\"PHYSICS, ATOMIC, MOLECULAR & CHEMICAL\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Russian Journal of Physical Chemistry B","FirstCategoryId":"92","ListUrlMain":"https://link.springer.com/article/10.1134/S1990793123030235","RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"PHYSICS, ATOMIC, MOLECULAR & CHEMICAL","Score":null,"Total":0}
Modeling and Simulation of a Microwave-Assisted Plasma with Different Input Power for Plasma-Based Applications
Plasma technology is used in various fields such as ozone generation, surface treatment, medicine and so on. Wave generated plasmas such as microwave plasma, is a promising technology for its interesting and versatile features. These features of microwave plasma are an alternative technology compared to traditional thermal chemical reactors provided certain technical challenges are overcome. In this numerical study, the properties of microwave-powered plasma operated at frequency of 2.45 GHz and in argon gas at atmospheric pressure were investigated. By varying the input power of the device in transvers magnetic (TM) mode, the comparative profiles of the electron density, the electron temperature, the electric field and the power deposition are demonstrated. Simulation results show chemical generation in microwave plasma. High energy electrons and electron density have been considered to be the main factors affecting microwave plasma properties.
期刊介绍：
Russian Journal of Physical Chemistry B: Focus on Physics is a journal that publishes studies in the following areas: elementary physical and chemical processes; structure of chemical compounds, reactivity, effect of external field and environment on chemical transformations; molecular dynamics and molecular organization; dynamics and kinetics of photoand radiation-induced processes; mechanism of chemical reactions in gas and condensed phases and at interfaces; chain and thermal processes of ignition, combustion and detonation in gases, two-phase and condensed systems; shock waves; new physical methods of examining chemical reactions; and biological processes in chemical physics.
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