使用可光移保护基团的DNA连接。

Nucleic acids symposium series (2004) Pub Date : 2009-01-01 DOI:10.1093/nass/nrp087

Yuta Kawano, Tadao Takada, Mitsunobu Nakamura, Kazushige Yamana

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引用次数: 1

摘要

基于光化学反应的模板定向寡核苷酸连接由于其在生物医学和合成方面的应用而引起了人们的广泛关注。在这项研究中，我们利用光可去除的保护基团和硫醇-二硫交换反应来进行DNA的光螯合。合成了邻硝基苯衍生物的亚胺磷，并在DNA合成器上采用常规亚胺磷化学方法合成了含硝基苯保护巯基和二硫基修饰的DNA。结果表明，硝基苯基与紫外光的光化学反应产生游离巯基，通过巯基-二硫交换反应导致DNA连接。

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DNA ligation using photoremovable protecting groups.

Template-directed ligation of oligonucleotides by photochemical reaction has attracted much interest because of its biomedical and synthetic applications. In this study, we developed photoligaton of DNA by using a photoremovable protecting group and thiol-disulfide exchange reaction. A phosphoroamidite of o-nitrobenzyl derivatives were synthesized, and DNA modified with a nitrobenzyl-protected thiol group and disulfide group was synthesized by conventional phosphoroamidite chemistry using a DNA synthesizer. It was shown that photochemical reaction of a nitrobenzyl group with UV irradiation produced a free thiol group, leading to the DNA ligation through the thiol-disulfide exchange reaction.

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Nucleic acids symposium series (2004)

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