沉积电位对Sn-Ag-Cu三元合金可焊镀层在深共晶溶剂中电沉积的影响

IF 4.5 3区 化学 Q1 Chemical Engineering
Jiacheng Huang , Wenchang Wang , Qian Xiang , Shuiping Qin , Pengju Wang , Naotoshi Mitsuzaki , Zhidong Chen
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引用次数: 0

摘要

采用深共晶溶剂基电解质,在不同的沉积电位下,电沉积了Sn-Ag-Cu三元可焊合金镀层。通过扫描电子显微镜(SEM)、能量色散x射线能谱(EDX)和x射线衍射(XRD)对所得沉积物的表面形貌、成分、晶粒和物相进行了表征。为了获得合金熔点的信息,采用了差示扫描量热法(DSC)。结果表明:随着沉积电位的增大,镀层的晶粒越细,镀层越致密;此外,较高的阴极沉积电位有利于Cu6Sn5相的存在,而在较低的电位值下则有利于Ag3Sn相的存在。在−1.2 V电位下沉积的Sn-Ag-Cu合金(Sn90.9-Ag7.6-Cu1.5)熔点为215.02℃。根据Scharifker-Hills模型对电流-时间曲线的分析结果,发现单金属和合金的沉积过程都是由扩散控制的成核和三维生长。锡和银的沉积过程是瞬时机制,而铜的沉积过程是渐进机制。Sn-Ag-Cu合金的沉积过程偏离瞬时形核。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Effect of deposition potential on electrodeposition of Sn-Ag-Cu ternary alloy solderable coating in deep eutectic solvent

Ternary Sn-Ag-Cu solderable alloy coatings were electrodeposited using deep eutectic solvent-based electrolytes, at different deposition potentials. The obtained deposits have been characterized from surface morphology, composition, crystalline grain and phase via Scanning Electron Microscopy (SEM) associated with Energy Dispersive X-ray spectroscopy (EDX) and X-ray diffraction (XRD). To get information on the alloy melting point, Differential Scanning Calorimetry (DSC) has been involved.

The results showed that the crystalline grain became finer and the coating became denser as the deposition potential increased. In addition, the presence of Cu6Sn5 phase is facilitated by more cathodic deposition potentials while the Ag3Sn phase was evidenced at lower potential values. The value of the melting point of Sn-Ag-Cu alloy (Sn90.9-Ag7.6-Cu1.5) deposited at potentials of −1.2 V was of 215.02 ℃. Based on the results obtained during the analysis of the current–time curves using the Scharifker-Hills' model, it has been found that both single metal and alloy deposition processes correspond to a nucleation and tridimensional growth controlled by diffusion. The deposition processes of Sn and Ag are conducted by an instantaneous mechanism, while in the case of Cu, a progressive one has been determined. The deposition process of Sn-Ag-Cu alloy showed a deviation from the instantaneous nucleation.

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来源期刊
Journal of Electroanalytical Chemistry
Journal of Electroanalytical Chemistry Chemical Engineering-General Chemical Engineering
CiteScore
7.50
自引率
6.70%
发文量
912
审稿时长
>12 weeks
期刊介绍: The Journal of Electroanalytical Chemistry is the foremost international journal devoted to the interdisciplinary subject of electrochemistry in all its aspects, theoretical as well as applied. Electrochemistry is a wide ranging area that is in a state of continuous evolution. Rather than compiling a long list of topics covered by the Journal, the editors would like to draw particular attention to the key issues of novelty, topicality and quality. Papers should present new and interesting electrochemical science in a way that is accessible to the reader. The presentation and discussion should be at a level that is consistent with the international status of the Journal. Reports describing the application of well-established techniques to problems that are essentially technical will not be accepted. Similarly, papers that report observations but fail to provide adequate interpretation will be rejected by the Editors. Papers dealing with technical electrochemistry should be submitted to other specialist journals unless the authors can show that their work provides substantially new insights into electrochemical processes.
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