Jiacheng Huang , Wenchang Wang , Qian Xiang , Shuiping Qin , Pengju Wang , Naotoshi Mitsuzaki , Zhidong Chen
{"title":"沉积电位对Sn-Ag-Cu三元合金可焊镀层在深共晶溶剂中电沉积的影响","authors":"Jiacheng Huang , Wenchang Wang , Qian Xiang , Shuiping Qin , Pengju Wang , Naotoshi Mitsuzaki , Zhidong Chen","doi":"10.1016/j.jelechem.2023.117613","DOIUrl":null,"url":null,"abstract":"<div><p>Ternary Sn-Ag-Cu solderable alloy coatings were electrodeposited using deep eutectic solvent-based electrolytes, at different deposition potentials. The obtained deposits have been characterized from surface morphology, composition, crystalline grain and phase via Scanning Electron Microscopy (SEM) associated with Energy Dispersive X-ray spectroscopy (EDX) and X-ray diffraction (XRD). To get information on the alloy melting point, Differential Scanning Calorimetry (DSC) has been involved.</p><p>The results showed that the crystalline grain became finer and the coating became denser as the deposition potential increased. In addition, the presence of Cu<sub>6</sub>Sn<sub>5</sub> phase is facilitated by more cathodic deposition potentials while the Ag<sub>3</sub>Sn phase was evidenced at lower potential values. The value of the melting point of Sn-Ag-Cu alloy (Sn90.9-Ag7.6-Cu1.5) deposited at potentials of −1.2 V was of 215.02 ℃. Based on the results obtained during the analysis of the current–time curves using the Scharifker-Hills' model, it has been found that both single metal and alloy deposition processes correspond to a nucleation and tridimensional growth controlled by diffusion. The deposition processes of Sn and Ag are conducted by an instantaneous mechanism, while in the case of Cu, a progressive one has been determined. The deposition process of Sn-Ag-Cu alloy showed a deviation from the instantaneous nucleation.</p></div>","PeriodicalId":50545,"journal":{"name":"Journal of Electroanalytical Chemistry","volume":"943 ","pages":"Article 117613"},"PeriodicalIF":4.5000,"publicationDate":"2023-08-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Effect of deposition potential on electrodeposition of Sn-Ag-Cu ternary alloy solderable coating in deep eutectic solvent\",\"authors\":\"Jiacheng Huang , Wenchang Wang , Qian Xiang , Shuiping Qin , Pengju Wang , Naotoshi Mitsuzaki , Zhidong Chen\",\"doi\":\"10.1016/j.jelechem.2023.117613\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>Ternary Sn-Ag-Cu solderable alloy coatings were electrodeposited using deep eutectic solvent-based electrolytes, at different deposition potentials. The obtained deposits have been characterized from surface morphology, composition, crystalline grain and phase via Scanning Electron Microscopy (SEM) associated with Energy Dispersive X-ray spectroscopy (EDX) and X-ray diffraction (XRD). To get information on the alloy melting point, Differential Scanning Calorimetry (DSC) has been involved.</p><p>The results showed that the crystalline grain became finer and the coating became denser as the deposition potential increased. In addition, the presence of Cu<sub>6</sub>Sn<sub>5</sub> phase is facilitated by more cathodic deposition potentials while the Ag<sub>3</sub>Sn phase was evidenced at lower potential values. The value of the melting point of Sn-Ag-Cu alloy (Sn90.9-Ag7.6-Cu1.5) deposited at potentials of −1.2 V was of 215.02 ℃. Based on the results obtained during the analysis of the current–time curves using the Scharifker-Hills' model, it has been found that both single metal and alloy deposition processes correspond to a nucleation and tridimensional growth controlled by diffusion. The deposition processes of Sn and Ag are conducted by an instantaneous mechanism, while in the case of Cu, a progressive one has been determined. The deposition process of Sn-Ag-Cu alloy showed a deviation from the instantaneous nucleation.</p></div>\",\"PeriodicalId\":50545,\"journal\":{\"name\":\"Journal of Electroanalytical Chemistry\",\"volume\":\"943 \",\"pages\":\"Article 117613\"},\"PeriodicalIF\":4.5000,\"publicationDate\":\"2023-08-15\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Electroanalytical Chemistry\",\"FirstCategoryId\":\"92\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S1572665723004733\",\"RegionNum\":3,\"RegionCategory\":\"化学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q1\",\"JCRName\":\"Chemical Engineering\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Electroanalytical Chemistry","FirstCategoryId":"92","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S1572665723004733","RegionNum":3,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"Chemical Engineering","Score":null,"Total":0}
Effect of deposition potential on electrodeposition of Sn-Ag-Cu ternary alloy solderable coating in deep eutectic solvent
Ternary Sn-Ag-Cu solderable alloy coatings were electrodeposited using deep eutectic solvent-based electrolytes, at different deposition potentials. The obtained deposits have been characterized from surface morphology, composition, crystalline grain and phase via Scanning Electron Microscopy (SEM) associated with Energy Dispersive X-ray spectroscopy (EDX) and X-ray diffraction (XRD). To get information on the alloy melting point, Differential Scanning Calorimetry (DSC) has been involved.
The results showed that the crystalline grain became finer and the coating became denser as the deposition potential increased. In addition, the presence of Cu6Sn5 phase is facilitated by more cathodic deposition potentials while the Ag3Sn phase was evidenced at lower potential values. The value of the melting point of Sn-Ag-Cu alloy (Sn90.9-Ag7.6-Cu1.5) deposited at potentials of −1.2 V was of 215.02 ℃. Based on the results obtained during the analysis of the current–time curves using the Scharifker-Hills' model, it has been found that both single metal and alloy deposition processes correspond to a nucleation and tridimensional growth controlled by diffusion. The deposition processes of Sn and Ag are conducted by an instantaneous mechanism, while in the case of Cu, a progressive one has been determined. The deposition process of Sn-Ag-Cu alloy showed a deviation from the instantaneous nucleation.
期刊介绍:
The Journal of Electroanalytical Chemistry is the foremost international journal devoted to the interdisciplinary subject of electrochemistry in all its aspects, theoretical as well as applied.
Electrochemistry is a wide ranging area that is in a state of continuous evolution. Rather than compiling a long list of topics covered by the Journal, the editors would like to draw particular attention to the key issues of novelty, topicality and quality. Papers should present new and interesting electrochemical science in a way that is accessible to the reader. The presentation and discussion should be at a level that is consistent with the international status of the Journal. Reports describing the application of well-established techniques to problems that are essentially technical will not be accepted. Similarly, papers that report observations but fail to provide adequate interpretation will be rejected by the Editors. Papers dealing with technical electrochemistry should be submitted to other specialist journals unless the authors can show that their work provides substantially new insights into electrochemical processes.