电子污渍。1 . DNA与铀酰盐相互作用的化学研究。

C R ZOBEL, M BEER
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引用次数: 108

摘要

人们对DNA与铀酰盐的相互作用进行了化学研究。研究了pH值、盐浓度和DNA结构完整性对盐-底物复合物化学计量学的影响。在pH为3.5时,DNA与低浓度的铀酰离子相互作用,生成UO(2) (++)/P摩尔比约为(1/2)的底物金属离子配合物,并具有较大的结合常数。在低pH(约2.3)时,摩尔比降至约(1/3)。在HCHO溶液中加热破坏DNA的结构完整性会导致金属离子结合量的类似下降。将pH值提高到3.5以上,就像增加盐溶液的浓度一样,结合力明显增加。这种附加绑定具有较低的关联常数。在类似条件下,DNA结合铀酰离子的能力是牛血清白蛋白的7倍,这表明在电子显微镜染色中具有有用的选择性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Electron stains. I. Chemical studies on the interaction of DNA with uranyl salts.

Chemical studies have been carried out on the interaction of DNA with uranyl salts. The effect of variations in pH, salt concentration, and structural integrity of the DNA on the stoichiometry of the salt-substrate complex have been investigated. At pH 3.5 DNA interacts with uranyl ions in low concentration yielding a substrate metal ion complex with a UO(2) (++)/P mole ratio of about (1/2) and having a large association constant. At low pH's (about 2.3) the mole ratio decreases to about (1/3). Destruction of the structural integrity of the DNA by heating in HCHO solutions leads to a similar drop in the amount of metal ion bound. Raising the pH above 3.5 leads to an apparent increase in binding as does increasing the concentration of the salt solution. This additional binding has a lower association constant. Under similar conditions DNA binds about seven times more uranyl ion than bovine serum albumin, indicating useful selectivity in staining for electron microscopy.

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