过氧基和c中心自由基与巯基的反应机理

Michael G. Simic, Edward P.L. Hunter
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引用次数: 22

摘要

测定了过氧基(ccl300·)和c中心自由基,即苯基(·C6H4CH2COO−)和乙烯基(uracil-5-yl)与芳香巯基(p-CH3OC6H4SH)在pH范围(3-12)内(包括ArSH和ArS−)的反应速率常数。这些速率常数对pH值的依赖性表明过氧自由基的反应是氧化还原机制,而c中心自由基的反应是h原子转移过程。在修复各种自由基的过程中遇到的不同机制建议将设计特征纳入到抗菌剂中,例如放射性保护剂和抗癌剂。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Reaction mechanisms of peroxyl and c-centered radicals with sulfhydryls

Rate constants for reactions of a peroxyl (CCl3OO·) and C-centered radicals, that is, phenyl (·C6H4CH2COO) and vinyl (uracil-5-yl), with an aromatic thiol (p-CH3OC6H4SH) were measured over a pH range (3–12) to include ArSH and ArS forms. The pH dependence of these rate constants indicates that peroxyl radicals react by a redox mechanism while the C-centered radicals react by an H-atom transfer process. The different mechanisms encountered in the repair of various radicals suggest design features to be incorporated into antiagents, such as radioprotectors and anticarcinogens.

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