Qiangsheng Zhan, Xinyu Yang, Zixuan Wang, Zimeng Li, Shifeng Luo and Jiuxing Zhang
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引用次数: 0
摘要
采用光学浮区技术制备了β-Ga2O3[100]单晶。当转速从12转/分增加到15转/分时,周期性生长条纹消失。随着生长速率从10 ~ 15 mm h−1增加,熔化区高度从11.9 mm增加到12.8 mm。在V = 12 mm h−1时得到的β-Ga2O3单晶半最大宽(FWHM)为0.139°。阶梯状凹坑的形成与晶体的解离特性有关,而梯形和菱形凹坑的形成与β-Ga2O3单晶的缺陷有关。边缘位错在(400)和(002)面存在,但在(- 601)面不存在。拉曼光谱和紫外吸收光谱表明,在V = 12 mm h−1和R = 15 rpm条件下制备的β-Ga2O3单晶质量最好。
Dynamic stability, microstructure and optoelectronic performance of β-Ga2O3 single crystals prepared by the optical floating zone technique
β-Ga2O3 [100] single crystals were prepared by the optical floating zone technique. As the rotation rate was increased from 12 to 15 rpm, the periodic growth stripes disappeared. The height of the melting zone increased from 11.9 mm to 12.8 mm with the increase in the growth rate from 10 to 15 mm h−1. The full width at half maximum (FWHM) of the β-Ga2O3 single crystal obtained at V = 12 mm h−1 is 0.139°. The formation of step-like pits was related with the dissociation characteristics of the crystal, whereas the formations of the trapezoidal and rhomboid pits were ascribed to the defects in the β-Ga2O3 single crystal. The edge dislocations are present on the (400) and (002) planes, but are absent on the (−601) plane. The Raman and ultraviolet absorption spectra indicated that the β-Ga2O3 single crystal prepared at V = 12 mm h−1 and R = 15 rpm exhibited the highest quality.