氮化铝薄膜物理性质的原子力显微镜研究

IF 0.9 4区物理与天体物理 Q4 PHYSICS, APPLIED

Technical Physics Letters Pub Date : 2025-07-20 DOI:10.1134/S1063785025700129

V. I. Strunin, L. V. Baranova, N. A. Davletkil’deev, A. Yu. Kuklev, N. A. Chirikov

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引用次数: 0

摘要

本文报道了用真空磁控溅射法测量不同厚度氮化铝膜的粗糙度和纵向压电模量d33的结果。描述了合成薄膜的特性，并给出了薄膜表面形貌的原子力显微镜图像。结果表明，当钼形成成核层时，薄膜的粗糙度降低，两种材料的压电模量d33相似。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

Atomic Force Microscopy Study of the Physical Properties of Aluminum Nitride Thin Films

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Atomic Force Microscopy Study of the Physical Properties of Aluminum Nitride Thin Films

The results of the measurements of the roughness and longitudinal piezoelectric modulus d₃₃ of aluminum nitride films of different thicknesses obtained by vacuum magnetron sputtering are reported. The characteristics of the synthesized films are described and atomic force microscopy images of the film surface morphology are presented. It is shown that the roughness of the obtained films decreases when a nucleation layer is formed from molybdenum and the piezoelectric moduli d₃₃ of the two materials are similar.

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来源期刊

Technical Physics Letters 物理-物理：应用

CiteScore

1.50

自引率

0.00%

发文量

审稿时长

2-4 weeks

期刊介绍： Technical Physics Letters is a companion journal to Technical Physics and offers rapid publication of developments in theoretical and experimental physics with potential technological applications. Recent emphasis has included many papers on gas lasers and on lasing in semiconductors, as well as many reports on high Tc superconductivity. The excellent coverage of plasma physics seen in the parent journal, Technical Physics, is also present here with quick communication of developments in theoretical and experimental work in all fields with probable technical applications. Topics covered are basic and applied physics; plasma physics; solid state physics; physical electronics; accelerators; microwave electron devices; holography.