Desorption of fragments upon electron impact on adsorbates: implications for electron beam induced deposition

A molecular level understanding of surface chemistry involved in the focused electron beam induced deposition (FEBID) with metalorganic molecules is crucial for enhancing metal content in the nanostructures. Here we investigate the FEBID process of trimethyl(methylcyclopentadienyl)platinum(IV) [MeCpPtMe₃] using focused electron beam induced mass spectrometry (FEBiMS), a recently developed in situ analytical technique. A comparison with gas-phase electron impact fragmentation, along with density-functional-theoretical calculations and molecular dynamics simulations are presented. The results indicate that charged fragments generated via dissociative ionization exhibit strong adsorption to the substrate and lack sufficient kinetic energy to desorb, suggesting that the most observed charged species during FEBID originate from gasphase fragmentation above the surface. Furthermore, this study proposes processes like charge neutralization and dissociative recombination, mechanisms not previously considered in FEBID, could be significant contributors for increasing metal content in the resulting nanostructures.