不同剂量γ射线辐照下氮化镓薄膜黄带与缺陷态的关系

IF 0.9 4区 物理与天体物理 Q3 PHYSICS, MULTIDISCIPLINARY
Kyoung Su Lee, Dong-Seok Kim, Eun Kyu Kim
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引用次数: 0

摘要

用300 ~ 3000 krad不同剂量的γ射线辐照生长在c平面蓝宝石衬底上的GaN薄膜。从光致发光(PL)测量来看,黄色PL (YL)强度随γ射线辐照剂量的增加而降低。通过深能级瞬态光谱(DLTS)分析,样品在导带边缘以下存在E1、E2和E5能级缺陷态,其活化能分别为0.17±0.02、0.52±0.01和0.97±0.02 eV。E1、E2和E5水平分别源于氮空位(VN)、氮反位(NGa)和间隙氮(Ni)缺陷。随着γ射线剂量的增加,NGa的Nt值增加,而VN、Ni、VGa-Ni复合物的Nt值降低。因此,推测黄色PL带来源于VGa-Ni配合物。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A relation between yellow band and defect states of GaN epilayers during gamma-ray irradiation with different doses

GaN epilayers grown on c-plane sapphire substrates were irradiated with different doses of γ-rays ranging from 300 to 3000 krad. From the photoluminescence (PL) measurement, the yellow PL (YL) intensity decreased with increasing the γ-ray irradiation dose. From the deep level transient spectroscopy (DLTS), three defect states of E1, E2, and E5 levels with activation energies of 0.17 ± 0.02, 0.52 ± 0.01, and 0.97 ± 0.02 eV below the conduction band edge were found in the samples. The E1, E2, and E5 levels originated from the defects of nitrogen vacancy (VN), nitrogen antisite (NGa), and interstitial nitrogen (Ni), respectively. With increasing γ-ray doses, the Nt value of NGa was increased, while the Nt values of VN, Ni, VGaNi complex decreased. Therefore, it was suggested that the yellow PL band originated from the VGaNi complex.

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来源期刊
Journal of the Korean Physical Society
Journal of the Korean Physical Society PHYSICS, MULTIDISCIPLINARY-
CiteScore
1.20
自引率
16.70%
发文量
276
审稿时长
5.5 months
期刊介绍: The Journal of the Korean Physical Society (JKPS) covers all fields of physics spanning from statistical physics and condensed matter physics to particle physics. The manuscript to be published in JKPS is required to hold the originality, significance, and recent completeness. The journal is composed of Full paper, Letters, and Brief sections. In addition, featured articles with outstanding results are selected by the Editorial board and introduced in the online version. For emphasis on aspect of international journal, several world-distinguished researchers join the Editorial board. High quality of papers may be express-published when it is recommended or requested.
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