{"title":"氮化类金刚石涂层退火过程中键结结构和表面形貌的演变","authors":"Jihua Peng, Da Peng, Guoge Zhang, Jiacheng Liao","doi":"10.1186/s40712-025-00321-9","DOIUrl":null,"url":null,"abstract":"<div><p>Nitrogenated amorphous C (a-C:N) coatings with an intermediate sp<sup>3</sup> C fraction of 30%–55% and N content of 0–5 at.% were deposited on single-crystal silicon wafer substrates via intermittent filtered cathode vacuum arc deposition. Some of the coated specimens were annealed at 300 and 600 °C for 4 h in a 5-Pa vacuum. The morphologies, microstructures, and the bonding structure of the specimens were characterized using scanning electron microscopy, X-ray photoelectron spectroscopy, and micro-Raman spectroscopy. The mechanical characteristics of the coatings, including the residual stress and hardness, were measured. Of the doped N content in the coatings, 60%–70% formed a pyridine- and pyrrole-like ring configuration of sp<sup>2</sup> C = N bonds. As the N content was increased, the fraction of pyridine-like bonds decreased, and the pyrrole-like configuration gradually became dominant. Compared to the N-free coatings, the thermally stable temperature of the nitrogenated coatings decreased to approximately 300 °C, and their surface roughness increased after annealing at 600 °C. The increase in the ratio of pyridine-like to pyrrole-like bonds (<i>R</i><sub>pyd-pyr</sub>) in the coatings increased the number of voids and pinholes in the surface layer. However, the top surface of the a-C:N coating with 3.4 at.% N annealed at 600 °C remained smooth almost without voids, which could be ascribed to its suitable <i>R</i><sub>pyd-pyr</sub> and high sp<sup>2</sup> C = C fraction.</p><h3>Graphical Abstract</h3>\n<div><figure><div><div><picture><source><img></source></picture></div></div></figure></div></div>","PeriodicalId":592,"journal":{"name":"International Journal of Mechanical and Materials Engineering","volume":"20 1","pages":""},"PeriodicalIF":2.0000,"publicationDate":"2025-08-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://jmsg.springeropen.com/counter/pdf/10.1186/s40712-025-00321-9","citationCount":"0","resultStr":"{\"title\":\"Evolution of bond structure and surface morphology of nitrogenated diamond-like carbon coatings during annealing\",\"authors\":\"Jihua Peng, Da Peng, Guoge Zhang, Jiacheng Liao\",\"doi\":\"10.1186/s40712-025-00321-9\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>Nitrogenated amorphous C (a-C:N) coatings with an intermediate sp<sup>3</sup> C fraction of 30%–55% and N content of 0–5 at.% were deposited on single-crystal silicon wafer substrates via intermittent filtered cathode vacuum arc deposition. Some of the coated specimens were annealed at 300 and 600 °C for 4 h in a 5-Pa vacuum. The morphologies, microstructures, and the bonding structure of the specimens were characterized using scanning electron microscopy, X-ray photoelectron spectroscopy, and micro-Raman spectroscopy. The mechanical characteristics of the coatings, including the residual stress and hardness, were measured. Of the doped N content in the coatings, 60%–70% formed a pyridine- and pyrrole-like ring configuration of sp<sup>2</sup> C = N bonds. As the N content was increased, the fraction of pyridine-like bonds decreased, and the pyrrole-like configuration gradually became dominant. Compared to the N-free coatings, the thermally stable temperature of the nitrogenated coatings decreased to approximately 300 °C, and their surface roughness increased after annealing at 600 °C. The increase in the ratio of pyridine-like to pyrrole-like bonds (<i>R</i><sub>pyd-pyr</sub>) in the coatings increased the number of voids and pinholes in the surface layer. However, the top surface of the a-C:N coating with 3.4 at.% N annealed at 600 °C remained smooth almost without voids, which could be ascribed to its suitable <i>R</i><sub>pyd-pyr</sub> and high sp<sup>2</sup> C = C fraction.</p><h3>Graphical Abstract</h3>\\n<div><figure><div><div><picture><source><img></source></picture></div></div></figure></div></div>\",\"PeriodicalId\":592,\"journal\":{\"name\":\"International Journal of Mechanical and Materials Engineering\",\"volume\":\"20 1\",\"pages\":\"\"},\"PeriodicalIF\":2.0000,\"publicationDate\":\"2025-08-06\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://jmsg.springeropen.com/counter/pdf/10.1186/s40712-025-00321-9\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"International Journal of Mechanical and Materials Engineering\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://link.springer.com/article/10.1186/s40712-025-00321-9\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"MATERIALS SCIENCE, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Journal of Mechanical and Materials Engineering","FirstCategoryId":"1085","ListUrlMain":"https://link.springer.com/article/10.1186/s40712-025-00321-9","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0
摘要
氮化非晶C (a-C:N)涂层,中间sp3 C分数为30% ~ 55%,N含量为0 ~ 5 at。采用间歇过滤阴极真空电弧沉积技术在单晶硅片衬底上沉积。部分涂层试样在300°C和600°C下在5pa真空中退火4h。利用扫描电子显微镜、x射线光电子能谱和微拉曼光谱对样品的形貌、微观结构和键合结构进行了表征。测试了涂层的力学性能,包括残余应力和硬度。在涂层中掺杂的N中,60% ~ 70%形成了sp2 C = N键的类吡啶和类吡咯环构型。随着氮含量的增加,类吡啶键的比例减少,类吡咯键逐渐占主导地位。与无氮涂层相比,在600℃退火后,含氮涂层的热稳定温度降至300℃左右,表面粗糙度增加。随着涂层中类吡啶键与类吡咯键(Rpyd-pyr)比例的增加,涂层表层的孔洞和针孔数量增加。然而,a-C:N涂层的顶表面具有3.4 at。% N在600℃退火后保持光滑,几乎没有空洞,这可归因于其合适的Rpyd-pyr和较高的sp2 C = C分数。图形抽象
Evolution of bond structure and surface morphology of nitrogenated diamond-like carbon coatings during annealing
Nitrogenated amorphous C (a-C:N) coatings with an intermediate sp3 C fraction of 30%–55% and N content of 0–5 at.% were deposited on single-crystal silicon wafer substrates via intermittent filtered cathode vacuum arc deposition. Some of the coated specimens were annealed at 300 and 600 °C for 4 h in a 5-Pa vacuum. The morphologies, microstructures, and the bonding structure of the specimens were characterized using scanning electron microscopy, X-ray photoelectron spectroscopy, and micro-Raman spectroscopy. The mechanical characteristics of the coatings, including the residual stress and hardness, were measured. Of the doped N content in the coatings, 60%–70% formed a pyridine- and pyrrole-like ring configuration of sp2 C = N bonds. As the N content was increased, the fraction of pyridine-like bonds decreased, and the pyrrole-like configuration gradually became dominant. Compared to the N-free coatings, the thermally stable temperature of the nitrogenated coatings decreased to approximately 300 °C, and their surface roughness increased after annealing at 600 °C. The increase in the ratio of pyridine-like to pyrrole-like bonds (Rpyd-pyr) in the coatings increased the number of voids and pinholes in the surface layer. However, the top surface of the a-C:N coating with 3.4 at.% N annealed at 600 °C remained smooth almost without voids, which could be ascribed to its suitable Rpyd-pyr and high sp2 C = C fraction.