用于增强快速开关光检测的纳米线异质结构。

Applied optics Pub Date : 2025-09-10 DOI:10.1364/AO.570442
Rajib Kumar Nanda, Mitra Barun Sarkar
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引用次数: 0

摘要

本文研究了一种基于异质结构TiO2/SnO2纳米线(NW)的快速开关光电探测器,该探测器是利用gld辅助电子束蒸发技术合成的。为了进行性能比较,还制作了异质结构TiO2/SnO2薄膜(TF)器件。NW和TF异质结构器件都是在n型硅(n-Si)衬底上以金(Au)为上接触点合成的。采用场发射扫描电镜(FESEM)、能量色散x射线能谱(EDS)和化学作图对样品进行形态和元素分析。利用x射线衍射(XRD)对其结构性能进行了表征。光学测量表明,异质结构TiO2/SnO2 NW样品在430 nm和673 nm处有两个宽可见吸收峰,与薄膜样品相比,其紫外吸收增强了2.18倍,可见光吸收增强了1.22倍。与TF器件相比,异质结构TiO2/SnO2 NW器件的光敏性提高了约10倍。此外,该方法还获得了更高的琼斯检测率1.193×1010和更低的噪声等效功率(NEP) 1.114×10-11W。电流-时间(I-T)特性显示了快速开关行为,上升时间为0.23 s,下降时间为0.31 s。这证实了该设备在高性能光探测应用方面的潜力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
GLAD-grown TiO2/SnO2 nanowire heterostructure for enhanced fast-switching photodetection.

This study investigates a fast-switching photodetector based on heterostructure TiO2/SnO2 nanowire (NW), synthesized by using the GLAD-assisted e-beam evaporation technique. For performance comparison, a heterostructure TiO2/SnO2 thin-film (TF) device was also fabricated. Both the NW and TF heterostructure devices were synthesized on n-type silicon (n-Si) substrates, with gold (Au) as the top contact. Field emission scanning electron microscopy (FESEM), energy-dispersive X-ray spectroscopy (EDS), and chemical mapping were employed to conduct morphological and elemental analysis. Characterization of structural properties was accomplished by using X-ray diffraction (XRD). Optical measurements indicated that with two broad visible absorption peaks at 430 nm and 673 nm, the heterostructure TiO2/SnO2 NW sample demonstrated a 2.18-fold enhancement in ultraviolet (UV) absorption and a 1.22-fold enhancement in visible light absorption when compared to its thin-film counterpart. The heterostructure TiO2/SnO2 NW device demonstrated a ∼10-fold photosensitivity enhancement in comparison to the TF device. In addition, it obtained a higher detectivity of 1.193×1010 Jones and a lower noise equivalent power (NEP) of 1.114×10-11W. Fast switching behavior was demonstrated by the current-time (I-T) characteristics, with a rise time of 0.23 s and a fall time of 0.31 s. This confirms the device's potential for high-performance photodetection applications.

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