{"title":"采用传统UV接触光刻技术的双模式波导谐振器。","authors":"Pei-Hsun Wang, Hung-Yu Chen, Yi Chang, Hsin-An Chen, Jia-Hao Cao, Yi-Xian Zhong, Chi-Ruei Huang","doi":"10.1364/AO.569558","DOIUrl":null,"url":null,"abstract":"<p><p>We propose a method for fabricating integrated microresonators using conventional ultraviolet contact lithography. By a double-patterning scheme, the bus- and resonator-waveguide can be lithography-patterned individually with a single photoresist spinning and etching process. A sub-µm gap is achieved between the bus- and resonator-waveguides, which exceeds the resolution limitation between patterns of the conventional contact-lithography process. The quality (Q) factor of waveguide resonators can be up to ≈10<sup>4</sup>, while the maximum measured extinction ratio of the resonator is larger than 20 dB. This double-patterning method offers easy fabrication, low cost, and sub-µm pitches for silicon photonics.</p>","PeriodicalId":101299,"journal":{"name":"Applied optics","volume":"64 27","pages":"7885-7892"},"PeriodicalIF":0.0000,"publicationDate":"2025-09-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Double-patterned waveguide resonators with conventional UV contact lithography.\",\"authors\":\"Pei-Hsun Wang, Hung-Yu Chen, Yi Chang, Hsin-An Chen, Jia-Hao Cao, Yi-Xian Zhong, Chi-Ruei Huang\",\"doi\":\"10.1364/AO.569558\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<p><p>We propose a method for fabricating integrated microresonators using conventional ultraviolet contact lithography. By a double-patterning scheme, the bus- and resonator-waveguide can be lithography-patterned individually with a single photoresist spinning and etching process. A sub-µm gap is achieved between the bus- and resonator-waveguides, which exceeds the resolution limitation between patterns of the conventional contact-lithography process. The quality (Q) factor of waveguide resonators can be up to ≈10<sup>4</sup>, while the maximum measured extinction ratio of the resonator is larger than 20 dB. This double-patterning method offers easy fabrication, low cost, and sub-µm pitches for silicon photonics.</p>\",\"PeriodicalId\":101299,\"journal\":{\"name\":\"Applied optics\",\"volume\":\"64 27\",\"pages\":\"7885-7892\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2025-09-20\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Applied optics\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1364/AO.569558\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Applied optics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/AO.569558","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Double-patterned waveguide resonators with conventional UV contact lithography.
We propose a method for fabricating integrated microresonators using conventional ultraviolet contact lithography. By a double-patterning scheme, the bus- and resonator-waveguide can be lithography-patterned individually with a single photoresist spinning and etching process. A sub-µm gap is achieved between the bus- and resonator-waveguides, which exceeds the resolution limitation between patterns of the conventional contact-lithography process. The quality (Q) factor of waveguide resonators can be up to ≈104, while the maximum measured extinction ratio of the resonator is larger than 20 dB. This double-patterning method offers easy fabrication, low cost, and sub-µm pitches for silicon photonics.