金属钝化层在降低Cu-Cu键合温度中的作用的原子尺度理论研究。

IF 2.5 4区 化学 Q4 BIOCHEMISTRY & MOLECULAR BIOLOGY
Haojie Dang, Wenchao Tian, Yongkun Wang, Si Chen, Hanyang Xu
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引用次数: 0

摘要

背景:低温Cu-Cu键合对3D集成至关重要。金属钝化层促进了这种键合,但其原子机制尚不完全清楚。在这里,分子动力学模拟研究了这些层如何增强原子扩散和降低键合温度。结果表明,温度和时间的增加加速了扩散,温度对扩散系数的指数效应主导扩散,而时间仅对扩散距离产生线性影响。金属钝化层的选择对工艺影响很大。钛(Ti)最有效地促进扩散。最初,钝化层中的扩散类似于大块金属的相互扩散,但随着时间的推移,钝化层内形成了大量更深的晶界,标志着向低能晶界扩散的转变。它促进低温Cu-Cu键合。多晶金的初始晶界进一步加速了扩散,降低了键合的活化能。因此,晶粒细化被认为是提高原子扩散和键合质量的有效手段。该工作为降低Cu-Cu键合温度提供了理论见解,并为优化键合工艺提供了科学依据。方法:利用LAMMPS封装进行分子动力学(MD)模拟,研究Cu-Cu与不同金属钝化层(Ag、Au、Ti、多晶Au)的键合。构建了cu -钝化层- cu模型,用MEAM势描述了原子间的相互作用。在目标温度为300 ps时,模拟了NVT系综下的扩散行为,利用OVITO可视化了键合界面的演变,并通过均方位移(MSD)导出了扩散系数和活化能,从而推断了钝化层在Cu-Cu键合中的作用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Atomic-scale theoretical investigation into the role of metal passivation layers in lowering Cu-Cu bonding temperature

Context

Low-temperature Cu-Cu bonding is critical for 3D integration. Metal passivation layers promote this bonding, but their atomic mechanisms are not fully understood. Here, molecular dynamics simulations investigate how these layers enhance atomic diffusion and reduce bonding temperature. Results show that increasing temperature and time accelerate diffusion, temperature dominates diffusion via its exponential effect on the diffusion coefficient, while time linearly influences only the diffusion distance. The choice of metal passivation layer significantly influences the process. Titanium (Ti) most effectively facilitates diffusion. Initially, diffusion in the passivation layer resembles bulk metal interdiffusion, but over time, the formation of numerous and deeper grain boundaries within the passivation layer occurs, marking a shift toward low-energy grain boundary diffusion. It promotes low-temperature Cu-Cu bonding. Polycrystalline gold, with its initial grain boundaries, further accelerates diffusion and lowers the activation energy for bonding. Therefore, grain refinement is identified as an effective means of enhancing atomic diffusion and bonding quality. This work provides theoretical insights into lowering the temperature of Cu-Cu bonding and offers scientific foundations for optimizing bonding processes.

Methods

Molecular dynamics (MD) simulations using the LAMMPS package were conducted to study Cu-Cu bonding with various metal passivation layers (Ag, Au, Ti, polycrystalline Au). The Cu-passivation layer-Cu model was constructed, with atomic interactions described by the MEAM potential. Diffusion behavior was simulated under the NVT ensemble at target temperatures for 300 ps. The bonding interface evolution was visualized using OVITO, and diffusion coefficients and activation energies were derived from the mean square displacement (MSD), enabling inference of the passivation layer’s role in Cu-Cu bonding.

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来源期刊
Journal of Molecular Modeling
Journal of Molecular Modeling 化学-化学综合
CiteScore
3.50
自引率
4.50%
发文量
362
审稿时长
2.9 months
期刊介绍: The Journal of Molecular Modeling focuses on "hardcore" modeling, publishing high-quality research and reports. Founded in 1995 as a purely electronic journal, it has adapted its format to include a full-color print edition, and adjusted its aims and scope fit the fast-changing field of molecular modeling, with a particular focus on three-dimensional modeling. Today, the journal covers all aspects of molecular modeling including life science modeling; materials modeling; new methods; and computational chemistry. Topics include computer-aided molecular design; rational drug design, de novo ligand design, receptor modeling and docking; cheminformatics, data analysis, visualization and mining; computational medicinal chemistry; homology modeling; simulation of peptides, DNA and other biopolymers; quantitative structure-activity relationships (QSAR) and ADME-modeling; modeling of biological reaction mechanisms; and combined experimental and computational studies in which calculations play a major role.
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