建筑辐射系统模型预测控制的模型选择与参数优化

IF 3.9 2区 计算机科学 Q2 AUTOMATION & CONTROL SYSTEMS
Qiong Chen , Wenjing Wang , Nan Li
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引用次数: 0

摘要

在这项工作中,我们提出了一项全面的参数研究,量化了不同保真度的降阶模型(ROMs)对用于建筑热调节的模型预测控制(MPC)回路的动态和稳态性能的影响。通过使用全阶模型和1-6阶ROMs的模拟,我们系统地确定了4阶或更高阶ROMs在0.2°C内实现温度超调,沉降时间小于15 min,当与12-24步的预测层和控制层≥ 2相匹配时,稳态误差小于0.5°C,从而匹配全阶MPC性能,同时减少计算量高达70% %。相比之下,最低阶ROM (ROM1)需要预测水平≤ 12,控制水平≥ 3才能将超调限制在1.0°C,将静态误差限制在1.2°C。此外,原始模型和高阶rom保持鲁棒控制(超调<;0.5℃,沉降时间<;10 min)在0.1 - 1.0和0.5 - 2.0的操纵变量权值范围内,而ROM1表现出很强的灵敏度,仅在mv率≈ 0.2和MO权值≈ 1.0附近可接受地工作。这些定量指导方针使从业者能够通过选择适当有序的ROM和在确定的数值范围内调整视野和权重来平衡计算成本和控制精度。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Model selection and parameter optimization of model predictive control for building radiant systems
In this work, we present a comprehensive parametric investigation quantifying the influence of reduced-order models (ROMs) of varying fidelity on both dynamic and steady-state performance of a Model Predictive Control (MPC) loop for building thermal regulation. Through simulations using the full-order model and ROMs of orders 1–6, we systematically determined that ROMs of order 4 or higher achieve temperature overshoots within 0.2 °C, settling times under 15 min, and steady-state errors below 0.5 °C when paired with prediction horizons of 12–24 steps and control horizons ≥ 2, thus matching full-order MPC performance while reducing computation by up to 70 %. In contrast, the lowest-order ROM (ROM1) requires a prediction horizon ≤ 12 and a control horizon ≥ 3 to limit overshoot to 1.0 °C and static error to 1.2 °C. Furthermore, the original model and high-order ROMs maintain robust control (overshoot < 0.5 °C, settling time < 10 min) across manipulated-variable rate weights from 0.1 to 1.0 and manipulated-output weights from 0.5 to 2.0, whereas ROM1 exhibits strong sensitivity, operating acceptably only near MV-rate ≈ 0.2 and MO weight ≈ 1.0. These quantitative guidelines enable practitioners to balance computational cost and control accuracy by selecting an appropriately ordered ROM and tuning horizons and weightings within the identified numerical ranges.
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来源期刊
Journal of Process Control
Journal of Process Control 工程技术-工程:化工
CiteScore
7.00
自引率
11.90%
发文量
159
审稿时长
74 days
期刊介绍: This international journal covers the application of control theory, operations research, computer science and engineering principles to the solution of process control problems. In addition to the traditional chemical processing and manufacturing applications, the scope of process control problems involves a wide range of applications that includes energy processes, nano-technology, systems biology, bio-medical engineering, pharmaceutical processing technology, energy storage and conversion, smart grid, and data analytics among others. Papers on the theory in these areas will also be accepted provided the theoretical contribution is aimed at the application and the development of process control techniques. Topics covered include: • Control applications• Process monitoring• Plant-wide control• Process control systems• Control techniques and algorithms• Process modelling and simulation• Design methods Advanced design methods exclude well established and widely studied traditional design techniques such as PID tuning and its many variants. Applications in fields such as control of automotive engines, machinery and robotics are not deemed suitable unless a clear motivation for the relevance to process control is provided.
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