一种用于Cs2LiYCl6晶体抛光的甘油基浆料

IF 3.2 3区工程技术 Q2 ENGINEERING, INDUSTRIAL

Cirp Annals-Manufacturing Technology Pub Date : 2025-01-01 DOI:10.1016/j.cirp.2025.04.092

Jiang Guo , Ankang Yuan , Jing Li , Zhe Yang , Zili Zhang , Lin Li (1)

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引用次数: 0

摘要

研制了一种用于c2liycl₆（CLYC）晶体精密抛光的甘油基浆料。选择甘油作为底液以减少过度潮解，同时加入乙醇以增强浆液的流动性。通过加入少量去离子水和二氧化硅磨料，浆液有效地平衡了潮解和机械材料去除。通过实验结果阐明了材料的去除机理。利用最优参数集，表面粗糙度（Ra）由900 nm降至85 nm。抛光后的CLYC: 0.5% Ce晶体能量分辨率达到5.73%，满足实际应用要求。

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A glycerol-based slurry for Cs2LiYCl6 crystal polishing

A glycerol-based slurry was developed for the precision polishing of Cs₂LiYCl₆ (CLYC) crystals. Glycerol was chosen as the base liquid to minimize excessive deliquescence, while ethanol was added to enhance the slurry's fluidity. By incorporating a small amount of deionized water and SiO₂ abrasives, the slurry effectively balances deliquescence with mechanical material removal. The material removal mechanism was elucidated through experimental results. Using the optimal parameter set, the surface roughness (Ra) was reduced from 900 nm to 85 nm. The energy resolution of the polished CLYC: 0.5% Ce crystal reached 5.73%, meeting the requirements for practical applications.

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来源期刊

Cirp Annals-Manufacturing Technology 工程技术-工程：工业

CiteScore

7.50

自引率

9.80%

发文量

137

审稿时长

13.5 months

期刊介绍： CIRP, The International Academy for Production Engineering, was founded in 1951 to promote, by scientific research, the development of all aspects of manufacturing technology covering the optimization, control and management of processes, machines and systems. This biannual ISI cited journal contains approximately 140 refereed technical and keynote papers. Subject areas covered include: Assembly, Cutting, Design, Electro-Physical and Chemical Processes, Forming, Abrasive processes, Surfaces, Machines, Production Systems and Organizations, Precision Engineering and Metrology, Life-Cycle Engineering, Microsystems Technology (MST), Nanotechnology.