Maksim Poliakov , Evgeniya Chernyshova , Dmitry Moskovskikh , Dmitry Kovalev , Philipp Kiryukhantsev-Korneev , Sergey Volodko , Fedor Bochkanov , Kirill Kuskov , Lidiya Volkova , Maksim Krasilnikov , Andrey Orlov , Dmitry Karpenkov , Alexander Rogachev
{"title":"磁控溅射制备CoCrFeNiTi高熵合金薄膜的可调TCR和热电性能","authors":"Maksim Poliakov , Evgeniya Chernyshova , Dmitry Moskovskikh , Dmitry Kovalev , Philipp Kiryukhantsev-Korneev , Sergey Volodko , Fedor Bochkanov , Kirill Kuskov , Lidiya Volkova , Maksim Krasilnikov , Andrey Orlov , Dmitry Karpenkov , Alexander Rogachev","doi":"10.1016/j.rsurfi.2025.100570","DOIUrl":null,"url":null,"abstract":"<div><div>CoCrFeNiTi high-entropy alloy (HEA) thin films were prepared on Si/SiO<sub>2</sub> substrate by DC magnetron sputtering from one target of Co<sub>0.22</sub>Cr<sub>0.23</sub>Fe<sub>0.29</sub>Ni<sub>0.2</sub>Ti<sub>0.06</sub> composition. The influence of sputtering time and power on the morphology, structure, chemical composition, resistivity, and temperature coefficient of resistance (TCR) has been studied. The thin films of the CoCrFeNiTi alloy exhibit a wide range of properties that can be tailored by adjusting the deposition parameters. The films demonstrate tunable TCR. The best TCR of 2.7 ± 0.8 ppm/°C has been achieved. In addition, a head-to-head comparison with state-of-the-art thin-film resistor materials (NiCr, TaN, and HEA analogues) is presented for the first time. The study of the thermoelectric properties of the obtained films revealed a highest power factor (PF) value of ∼0.015 mW/(m· °C²) and a linear behavior of PF increase in the range from −196 to 200 °C.</div></div>","PeriodicalId":21085,"journal":{"name":"Results in Surfaces and Interfaces","volume":"20 ","pages":"Article 100570"},"PeriodicalIF":0.0000,"publicationDate":"2025-05-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Tunable TCR and Thermoelectric Performance of CoCrFeNiTi High-Entropy Alloy Thin Films Fabricated by Magnetron Sputtering\",\"authors\":\"Maksim Poliakov , Evgeniya Chernyshova , Dmitry Moskovskikh , Dmitry Kovalev , Philipp Kiryukhantsev-Korneev , Sergey Volodko , Fedor Bochkanov , Kirill Kuskov , Lidiya Volkova , Maksim Krasilnikov , Andrey Orlov , Dmitry Karpenkov , Alexander Rogachev\",\"doi\":\"10.1016/j.rsurfi.2025.100570\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><div>CoCrFeNiTi high-entropy alloy (HEA) thin films were prepared on Si/SiO<sub>2</sub> substrate by DC magnetron sputtering from one target of Co<sub>0.22</sub>Cr<sub>0.23</sub>Fe<sub>0.29</sub>Ni<sub>0.2</sub>Ti<sub>0.06</sub> composition. The influence of sputtering time and power on the morphology, structure, chemical composition, resistivity, and temperature coefficient of resistance (TCR) has been studied. The thin films of the CoCrFeNiTi alloy exhibit a wide range of properties that can be tailored by adjusting the deposition parameters. The films demonstrate tunable TCR. The best TCR of 2.7 ± 0.8 ppm/°C has been achieved. In addition, a head-to-head comparison with state-of-the-art thin-film resistor materials (NiCr, TaN, and HEA analogues) is presented for the first time. The study of the thermoelectric properties of the obtained films revealed a highest power factor (PF) value of ∼0.015 mW/(m· °C²) and a linear behavior of PF increase in the range from −196 to 200 °C.</div></div>\",\"PeriodicalId\":21085,\"journal\":{\"name\":\"Results in Surfaces and Interfaces\",\"volume\":\"20 \",\"pages\":\"Article 100570\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2025-05-28\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Results in Surfaces and Interfaces\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S2666845925001576\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Results in Surfaces and Interfaces","FirstCategoryId":"1085","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S2666845925001576","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Tunable TCR and Thermoelectric Performance of CoCrFeNiTi High-Entropy Alloy Thin Films Fabricated by Magnetron Sputtering
CoCrFeNiTi high-entropy alloy (HEA) thin films were prepared on Si/SiO2 substrate by DC magnetron sputtering from one target of Co0.22Cr0.23Fe0.29Ni0.2Ti0.06 composition. The influence of sputtering time and power on the morphology, structure, chemical composition, resistivity, and temperature coefficient of resistance (TCR) has been studied. The thin films of the CoCrFeNiTi alloy exhibit a wide range of properties that can be tailored by adjusting the deposition parameters. The films demonstrate tunable TCR. The best TCR of 2.7 ± 0.8 ppm/°C has been achieved. In addition, a head-to-head comparison with state-of-the-art thin-film resistor materials (NiCr, TaN, and HEA analogues) is presented for the first time. The study of the thermoelectric properties of the obtained films revealed a highest power factor (PF) value of ∼0.015 mW/(m· °C²) and a linear behavior of PF increase in the range from −196 to 200 °C.
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