AlGaN量子阱外延中应变诱导的纳米级成分波动的原子见解

IF 5.3 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY
Chia-Yen Huang , Ying-Chun Chao , Hung-Wei Yen
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引用次数: 0

摘要

在两个初始位错密度不同的高质量AlN缓冲层上,采用相同的UVC发光二极管AlGaN生长工艺。我们通过高分辨率扫描透射电子显微镜(HR-STEM)和原子探针断层扫描(APT)对AlGaN epi进行了表征。基于HR-STEM的几何相位分析表明,在压缩应变更强的模板上生长的样品在多量子阱(MQW)区域具有更明显的局部晶格常数畸变。APT进一步验证了MQW中由应变诱导的Ga偏析引起的局部晶格畸变。对比成分分析表明,在外延生长过程中,纳米级的成分波动有利于Ga的进一步掺入,从而引发了AlGaN生长前沿的不稳定和新的缺陷成核。电子分散显微镜和APT的1-D组分谱分析表明,在AlGaN应力松弛过程中氮的解吸。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Atomic insights into strain-induced nanoscopic compositional fluctuation in AlGaN quantum well epitaxy
Identical UVC light-emitting diode AlGaN growth process was applied on two high-quality AlN buffer layers with different initial dislocation densities. We characterized the AlGaN epi by high-resolution scan transmission electron microscopy (HR-STEM) and atom probe tomography (APT). Geometry phase analysis with HR-STEM revealed the sample grown on the more compressively strained template possesses a more pronounced local lattice constant distortion in the multiple-quantum-well (MQW) region. APT further verified the local lattice distortion originated from the strain-induced Ga segregation in the MQW. The comparative compositional analysis revealed the nanoscopic compositional fluctuation favors further incorporation of Ga during epitaxial growth, which triggered the AlGaN growth front destabilization and new defect nucleation. The 1-D composition profiling from both electron dispersive microscopy and APT suggested nitrogen desorption during the AlGaN stress relaxation.
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来源期刊
Scripta Materialia
Scripta Materialia 工程技术-材料科学:综合
CiteScore
11.40
自引率
5.00%
发文量
581
审稿时长
34 days
期刊介绍: Scripta Materialia is a LETTERS journal of Acta Materialia, providing a forum for the rapid publication of short communications on the relationship between the structure and the properties of inorganic materials. The emphasis is on originality rather than incremental research. Short reports on the development of materials with novel or substantially improved properties are also welcomed. Emphasis is on either the functional or mechanical behavior of metals, ceramics and semiconductors at all length scales.
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