硅化工程加氢稳健铜催化剂

IF 3.2 3区 化学 Q2 CHEMISTRY, PHYSICAL
Xian Chen, Jiaojiao Zhao*, Baoyi Ren, Chunling Xin, Lin He* and Yuehui Li*, 
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引用次数: 0

摘要

叶状硅酸盐铜衍生的催化剂在加氢反应中有很好的应用前景,但由于铜的烧结和浸出而经常失活。在这里,我们提出了一个强大的20Cu@SiO2催化剂,通过一个动力学调制硅化过程,为碳酸乙烯加氢。第二步快速硅化反应通过层状硅酸铜中间体重新分配铜并形成介孔结构,增强了活性位点的稳定性和传质能力。性能测试和ICP分析表明,铜浸出率从17.9%降至1.1%,同时保持了优异的活性和选择性。nh3程序升温解吸和俄歇电子能谱证实二次硅化后Cu+种类增加。该策略有效地调节了Cu+/(Cu+ + Cu0)比,抑制了铜的浸出。这项工作提供了一种新的稳定方法,有可能延长Cu/SiO2催化剂的使用寿命,并推进耐用、高性能加氢催化剂的设计。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Silicification-Engineered Robust Copper Catalysts for Hydrogenation

Silicification-Engineered Robust Copper Catalysts for Hydrogenation

Copper phyllosilicate-derived catalysts are promising for hydrogenation reactions to produce important alcohols but often suffer from deactivation due to copper sintering and leaching. Here, we present a robust 20Cu@SiO2 catalyst, fabricated via a kinetically modulated silicification process, for the hydrogenation of ethylene carbonate. A secondary step of quick silicification redistributed copper and formed a mesoporous structure through Cu-phyllosilicate intermediates, enhancing the stability and mass transfer at active sites. Performance tests and ICP analysis showed improved stability, with copper leaching reduced from 17.9% to 1.1% while maintaining excellent activity and selectivity. NH3-temperature-programmed desorption and Auger electron spectroscopy confirmed increased Cu+ species after secondary silicification. This strategy effectively tunes the Cu+/(Cu+ + Cu0) ratio and suppresses copper leaching. This work provides a novel stabilization method with the potential to extend the lifespan of Cu/SiO2 catalysts and advance the design of durable, high-performance hydrogenation catalysts.

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来源期刊
The Journal of Physical Chemistry C
The Journal of Physical Chemistry C 化学-材料科学:综合
CiteScore
6.50
自引率
8.10%
发文量
2047
审稿时长
1.8 months
期刊介绍: The Journal of Physical Chemistry A/B/C is devoted to reporting new and original experimental and theoretical basic research of interest to physical chemists, biophysical chemists, and chemical physicists.
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