Comment on “Assessing the atmospheric fate of trifluoroacetaldehyde (CF3CHO) and its potential as a new source of fluoroform (HFC-23) using the AtChem2 box model” by Pérez-Peña et al., Environ. Sci.: Atmos., 2023, 3, 1767–1777, DOI: 10.1039/D3EA00120B

Recently Pérez-Peña et al. published a paper in this journal on the potential atmospheric fate of trifluoroacetaldehyde (CF₃CHO) as a source of CF₃H (HFC-23). In their work they utilized both a box model and a global chemistry and transport model to evaluate the production of CF₃H from the photolysis of CF₃CHO, the latter generated from photochemical oxidation of HFO-1234ze (CF₃CHCHF). Certain chemical assumptions and simplifications were made. We believe the assumptions utilized by Pérez-Peña et al. misrepresent the environmental fate of CF₃CHO. In the following, we present our comments on both the photolysis and the wet and dry deposition of CF₃CHO. Furthermore, we contemplate the impact of the potential deposition of CF₃CHO on the formation of trifluoroacetic acid (CF₃COOH) during the environmental processing of CF₃CHO.