Han Wu, Lincong Shu, Sihan Yan, Shulin Sha, Qing-Hua Zhang, Zeng Liu, Shan Li, Weihua Tang, Yuehui Wang, Jiaying Shen, Zhenping Wu, Kun Lin, Qiang Li, Jun Miao, Xianran Xing
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引用次数: 0
摘要
宽带隙半导体已成为一类有价值的深紫外敏感材料,显示出下一代集成器件的巨大潜力。然而,在低电源电压和弱光强条件下实现无复杂设计的高性能深紫外探测器是具有挑战性的。这里,我们设计一种新的方式来制造一个超灵敏vertical-structured Ga2O3光电探测器与外延oxygen-vacancy-rich研究作为导电层底部,实现检测一种罕见的弱深紫外光强度(0.1μW / cm²)电压5 V以下,和展示响应率激增(36 a / W为-4.8 V和2.2 a / W在4.8 V)和探测能力(2×1013琼斯-4.8 V和4.4×1013琼斯4.8 V)超快响应为0.64μs / 47.68μs(上升/衰变)。超薄(15 nm)的Ga2O3层和复杂的能带工程,结合In2O3层上的界面氧空缺抑制暗电流,增强了探测器在低电源电压和极低光强下的检测性能。这些结果为实现高灵敏度、低功耗和高度集成的深紫外检测提供了一条超越传统方法的途径。
Interfacial defect engineering to boost deep-ultraviolet photodetection based on a wide bandgap semiconductor heterostructure
Wide bandgap semiconductors have emerged as a valuable class of deep-ultraviolet sensitive materials, showing great potential for next-generation integrated devices. Yet, to achieve a high performance of deep-ultraviolet detector without complicated designs at low supply voltage and weak light intensity has proven challenging. Herein, we design a new way to fabricate an ultrasensitive vertical-structured Ga2O3 photodetector with epitaxial oxygen-vacancy-rich In2O3 as the bottom conductive layer, realizing the detection to a rare weak deep UV light intensity (0.1 μW/cm²) at a voltage below 5 V, and demonstrating a surge in responsivity (36 A/W at -4.8 V and 2.2 A/W at 4.8 V) and detectivity (2 × 1013 Jones at -4.8 V and 4.4 × 1013 Jones at 4.8 V) with ultrafast response of 0.64 μs/47.68 μs (rise/decay). Ultrathin (15 nm) Ga2O3 layer and sophisticated band engineering, combined with suppressed dark current through the interfacial oxygen vacancies on In2O3 layer, enhance the detection performance of the detector at low supply voltage and extremely low light intensity. These results provide a path towards highly sensitive, low-power-consumption and highly-integrated deep-ultraviolet detection, beyond conventional ones.