基于宽禁带半导体异质结构的界面缺陷工程促进深紫外光探测

IF 6.1 1区 化学 Q1 CHEMISTRY, INORGANIC & NUCLEAR
Han Wu, Lincong Shu, Sihan Yan, Shulin Sha, Qing-Hua Zhang, Zeng Liu, Shan Li, Weihua Tang, Yuehui Wang, Jiaying Shen, Zhenping Wu, Kun Lin, Qiang Li, Jun Miao, Xianran Xing
{"title":"基于宽禁带半导体异质结构的界面缺陷工程促进深紫外光探测","authors":"Han Wu, Lincong Shu, Sihan Yan, Shulin Sha, Qing-Hua Zhang, Zeng Liu, Shan Li, Weihua Tang, Yuehui Wang, Jiaying Shen, Zhenping Wu, Kun Lin, Qiang Li, Jun Miao, Xianran Xing","doi":"10.1039/d5qi00691k","DOIUrl":null,"url":null,"abstract":"Wide bandgap semiconductors have emerged as a valuable class of deep-ultraviolet sensitive materials, showing great potential for next-generation integrated devices. Yet, to achieve a high performance of deep-ultraviolet detector without complicated designs at low supply voltage and weak light intensity has proven challenging. Herein, we design a new way to fabricate an ultrasensitive vertical-structured Ga2O3 photodetector with epitaxial oxygen-vacancy-rich In2O3 as the bottom conductive layer, realizing the detection to a rare weak deep UV light intensity (0.1 μW/cm²) at a voltage below 5 V, and demonstrating a surge in responsivity (36 A/W at -4.8 V and 2.2 A/W at 4.8 V) and detectivity (2 × 1013 Jones at -4.8 V and 4.4 × 1013 Jones at 4.8 V) with ultrafast response of 0.64 μs/47.68 μs (rise/decay). Ultrathin (15 nm) Ga2O3 layer and sophisticated band engineering, combined with suppressed dark current through the interfacial oxygen vacancies on In2O3 layer, enhance the detection performance of the detector at low supply voltage and extremely low light intensity. These results provide a path towards highly sensitive, low-power-consumption and highly-integrated deep-ultraviolet detection, beyond conventional ones.","PeriodicalId":79,"journal":{"name":"Inorganic Chemistry Frontiers","volume":"87 1","pages":""},"PeriodicalIF":6.1000,"publicationDate":"2025-04-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Interfacial defect engineering to boost deep-ultraviolet photodetection based on a wide bandgap semiconductor heterostructure\",\"authors\":\"Han Wu, Lincong Shu, Sihan Yan, Shulin Sha, Qing-Hua Zhang, Zeng Liu, Shan Li, Weihua Tang, Yuehui Wang, Jiaying Shen, Zhenping Wu, Kun Lin, Qiang Li, Jun Miao, Xianran Xing\",\"doi\":\"10.1039/d5qi00691k\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Wide bandgap semiconductors have emerged as a valuable class of deep-ultraviolet sensitive materials, showing great potential for next-generation integrated devices. Yet, to achieve a high performance of deep-ultraviolet detector without complicated designs at low supply voltage and weak light intensity has proven challenging. Herein, we design a new way to fabricate an ultrasensitive vertical-structured Ga2O3 photodetector with epitaxial oxygen-vacancy-rich In2O3 as the bottom conductive layer, realizing the detection to a rare weak deep UV light intensity (0.1 μW/cm²) at a voltage below 5 V, and demonstrating a surge in responsivity (36 A/W at -4.8 V and 2.2 A/W at 4.8 V) and detectivity (2 × 1013 Jones at -4.8 V and 4.4 × 1013 Jones at 4.8 V) with ultrafast response of 0.64 μs/47.68 μs (rise/decay). Ultrathin (15 nm) Ga2O3 layer and sophisticated band engineering, combined with suppressed dark current through the interfacial oxygen vacancies on In2O3 layer, enhance the detection performance of the detector at low supply voltage and extremely low light intensity. These results provide a path towards highly sensitive, low-power-consumption and highly-integrated deep-ultraviolet detection, beyond conventional ones.\",\"PeriodicalId\":79,\"journal\":{\"name\":\"Inorganic Chemistry Frontiers\",\"volume\":\"87 1\",\"pages\":\"\"},\"PeriodicalIF\":6.1000,\"publicationDate\":\"2025-04-08\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Inorganic Chemistry Frontiers\",\"FirstCategoryId\":\"92\",\"ListUrlMain\":\"https://doi.org/10.1039/d5qi00691k\",\"RegionNum\":1,\"RegionCategory\":\"化学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q1\",\"JCRName\":\"CHEMISTRY, INORGANIC & NUCLEAR\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Inorganic Chemistry Frontiers","FirstCategoryId":"92","ListUrlMain":"https://doi.org/10.1039/d5qi00691k","RegionNum":1,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"CHEMISTRY, INORGANIC & NUCLEAR","Score":null,"Total":0}
引用次数: 0

摘要

宽带隙半导体已成为一类有价值的深紫外敏感材料,显示出下一代集成器件的巨大潜力。然而,在低电源电压和弱光强条件下实现无复杂设计的高性能深紫外探测器是具有挑战性的。这里,我们设计一种新的方式来制造一个超灵敏vertical-structured Ga2O3光电探测器与外延oxygen-vacancy-rich研究作为导电层底部,实现检测一种罕见的弱深紫外光强度(0.1μW / cm²)电压5 V以下,和展示响应率激增(36 a / W为-4.8 V和2.2 a / W在4.8 V)和探测能力(2×1013琼斯-4.8 V和4.4×1013琼斯4.8 V)超快响应为0.64μs / 47.68μs(上升/衰变)。超薄(15 nm)的Ga2O3层和复杂的能带工程,结合In2O3层上的界面氧空缺抑制暗电流,增强了探测器在低电源电压和极低光强下的检测性能。这些结果为实现高灵敏度、低功耗和高度集成的深紫外检测提供了一条超越传统方法的途径。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Interfacial defect engineering to boost deep-ultraviolet photodetection based on a wide bandgap semiconductor heterostructure
Wide bandgap semiconductors have emerged as a valuable class of deep-ultraviolet sensitive materials, showing great potential for next-generation integrated devices. Yet, to achieve a high performance of deep-ultraviolet detector without complicated designs at low supply voltage and weak light intensity has proven challenging. Herein, we design a new way to fabricate an ultrasensitive vertical-structured Ga2O3 photodetector with epitaxial oxygen-vacancy-rich In2O3 as the bottom conductive layer, realizing the detection to a rare weak deep UV light intensity (0.1 μW/cm²) at a voltage below 5 V, and demonstrating a surge in responsivity (36 A/W at -4.8 V and 2.2 A/W at 4.8 V) and detectivity (2 × 1013 Jones at -4.8 V and 4.4 × 1013 Jones at 4.8 V) with ultrafast response of 0.64 μs/47.68 μs (rise/decay). Ultrathin (15 nm) Ga2O3 layer and sophisticated band engineering, combined with suppressed dark current through the interfacial oxygen vacancies on In2O3 layer, enhance the detection performance of the detector at low supply voltage and extremely low light intensity. These results provide a path towards highly sensitive, low-power-consumption and highly-integrated deep-ultraviolet detection, beyond conventional ones.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
Inorganic Chemistry Frontiers
Inorganic Chemistry Frontiers CHEMISTRY, INORGANIC & NUCLEAR-
CiteScore
10.40
自引率
7.10%
发文量
587
审稿时长
1.2 months
期刊介绍: The international, high quality journal for interdisciplinary research between inorganic chemistry and related subjects
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信