Meisam Mahdavi , Amir Abdollah-Zadeh , Hassan Elmkhah
{"title":"PACVD法制备Ti-B-N膜时腐蚀性能的对比研究","authors":"Meisam Mahdavi , Amir Abdollah-Zadeh , Hassan Elmkhah","doi":"10.1016/j.jmrt.2025.03.097","DOIUrl":null,"url":null,"abstract":"<div><div>This study explores the time-dependent corrosion properties of titanium-boron-nitride (Ti–B–N) film applied through a pulsed-direct current plasma-assisted chemical vapor deposition (PACVD) method, comparing their performance with traditional titanium nitride (TiN) and titanium diboride (TiB<sub>2</sub>) films. The results revealed the nanocomposite structure of Ti–B–N film, characterized by a non-uniform atomic arrangement and irregular atomic distribution of amorphous BN surrounding the TiN nanocrystals. Electrochemical evaluations in a 3.5 wt% NaCl solution revealed that after 96 h of immersion, the Ti–B–N films had a charge transfer resistance (R<sub>ct</sub>) of 15980 Ω cm<sup>2</sup>, significantly outperforming TiN at 2755 Ω cm<sup>2</sup> and TiB<sub>2</sub> at 2593 Ω cm<sup>2</sup>. The corrosion current density (i<sub>corr</sub>) for Ti–B–N was measured at 0.193 μA/cm<sup>2</sup>, indicating enhanced corrosion resistance compared to 0.413 μA/cm<sup>2</sup> for TiN and 0.548 μA/cm<sup>2</sup> for TiB<sub>2</sub>. The remarkable corrosion resistance of the Ti–B–N film is ascribed to its low surface roughness (R<sub>a</sub> = 0.1 μm), optimal thickness (875 nm), and dense nanocomposite architecture.</div></div>","PeriodicalId":54332,"journal":{"name":"Journal of Materials Research and Technology-Jmr&t","volume":"36 ","pages":"Pages 80-97"},"PeriodicalIF":6.2000,"publicationDate":"2025-03-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"A comparative study on time-dependent corrosion properties of Ti–B–N films applied by PACVD method\",\"authors\":\"Meisam Mahdavi , Amir Abdollah-Zadeh , Hassan Elmkhah\",\"doi\":\"10.1016/j.jmrt.2025.03.097\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><div>This study explores the time-dependent corrosion properties of titanium-boron-nitride (Ti–B–N) film applied through a pulsed-direct current plasma-assisted chemical vapor deposition (PACVD) method, comparing their performance with traditional titanium nitride (TiN) and titanium diboride (TiB<sub>2</sub>) films. The results revealed the nanocomposite structure of Ti–B–N film, characterized by a non-uniform atomic arrangement and irregular atomic distribution of amorphous BN surrounding the TiN nanocrystals. Electrochemical evaluations in a 3.5 wt% NaCl solution revealed that after 96 h of immersion, the Ti–B–N films had a charge transfer resistance (R<sub>ct</sub>) of 15980 Ω cm<sup>2</sup>, significantly outperforming TiN at 2755 Ω cm<sup>2</sup> and TiB<sub>2</sub> at 2593 Ω cm<sup>2</sup>. The corrosion current density (i<sub>corr</sub>) for Ti–B–N was measured at 0.193 μA/cm<sup>2</sup>, indicating enhanced corrosion resistance compared to 0.413 μA/cm<sup>2</sup> for TiN and 0.548 μA/cm<sup>2</sup> for TiB<sub>2</sub>. The remarkable corrosion resistance of the Ti–B–N film is ascribed to its low surface roughness (R<sub>a</sub> = 0.1 μm), optimal thickness (875 nm), and dense nanocomposite architecture.</div></div>\",\"PeriodicalId\":54332,\"journal\":{\"name\":\"Journal of Materials Research and Technology-Jmr&t\",\"volume\":\"36 \",\"pages\":\"Pages 80-97\"},\"PeriodicalIF\":6.2000,\"publicationDate\":\"2025-03-12\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Materials Research and Technology-Jmr&t\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S2238785425006076\",\"RegionNum\":2,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q1\",\"JCRName\":\"MATERIALS SCIENCE, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Materials Research and Technology-Jmr&t","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S2238785425006076","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
A comparative study on time-dependent corrosion properties of Ti–B–N films applied by PACVD method
This study explores the time-dependent corrosion properties of titanium-boron-nitride (Ti–B–N) film applied through a pulsed-direct current plasma-assisted chemical vapor deposition (PACVD) method, comparing their performance with traditional titanium nitride (TiN) and titanium diboride (TiB2) films. The results revealed the nanocomposite structure of Ti–B–N film, characterized by a non-uniform atomic arrangement and irregular atomic distribution of amorphous BN surrounding the TiN nanocrystals. Electrochemical evaluations in a 3.5 wt% NaCl solution revealed that after 96 h of immersion, the Ti–B–N films had a charge transfer resistance (Rct) of 15980 Ω cm2, significantly outperforming TiN at 2755 Ω cm2 and TiB2 at 2593 Ω cm2. The corrosion current density (icorr) for Ti–B–N was measured at 0.193 μA/cm2, indicating enhanced corrosion resistance compared to 0.413 μA/cm2 for TiN and 0.548 μA/cm2 for TiB2. The remarkable corrosion resistance of the Ti–B–N film is ascribed to its low surface roughness (Ra = 0.1 μm), optimal thickness (875 nm), and dense nanocomposite architecture.
期刊介绍:
The Journal of Materials Research and Technology is a publication of ABM - Brazilian Metallurgical, Materials and Mining Association - and publishes four issues per year also with a free version online (www.jmrt.com.br). The journal provides an international medium for the publication of theoretical and experimental studies related to Metallurgy, Materials and Minerals research and technology. Appropriate submissions to the Journal of Materials Research and Technology should include scientific and/or engineering factors which affect processes and products in the Metallurgy, Materials and Mining areas.