溅射氧化铱电极的电化学阻抗谱数据分析。

Henry M Lutz, Yupeng Wu, Cynthia C Eluagu, Stuart F Cogan, Kevin J Otto, Mark E Orazem
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引用次数: 0

摘要

利用Watson和Orazem的测量模型程序分析了溅射氧化铱膜(siof)微电极在-0.4 ~ 0.6 V (Ag/AgCl)电位范围内的电化学阻抗谱(EIS)数据。用于分析的频率范围被确定为与Kramers-Kronig关系一致。此外,欧姆阻抗影响数据的频率被截断。在多孔电极的de Levie模型的基础上,建立了考虑裸露表面阻抗和多孔成分贡献的解释模型。该模型对36个EIS谱线均拟合良好。siof系统的有效电容在-0.4 V时为17000 μF/cm2,在0.2和0.4 V时最大可达30000 μF/cm2。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Analysis of Electrochemical Impedance Spectroscopy Data for Sputtered Iridium Oxide Electrodes.

The measurement model program from Watson and Orazem was used to analyze electrochemical impedance spectroscopy (EIS) data for sputtered iridium oxide film (SIROF) micro-electrodes at potentials ranging from -0.4 to 0.6 V (Ag/AgCl). The frequency range used for the analysis was that determined to be consistent with the Kramers-Kronig relations. In addition, frequencies at which the ohmic impedance influenced the data were truncated. An interpretation model was developed that considered the impedance of the bare surface and the contribution of a porous component, based on the de Levie model of porous electrodes. The proposed model fit all 36 EIS spectra well. The effective capacitance of the SIROF system ranged from 17,000 μF/cm2 at -0.4 V to a maximum of 30,000 μF/cm2 at 0.2 and 0.4 V.

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