CdSexTe1-x中V族掺杂与补偿的多尺度建模与优化

IF 5.5 3区 材料科学 Q2 CHEMISTRY, PHYSICAL
Xiaofeng Xiang*, Aaron Gehrke, Yijun Tong and Scott T. Dunham, 
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引用次数: 0

摘要

本文研究了CdSexTe1-x中V族元素的缺陷性质和掺杂限制。V族受体掺杂剂能够增加空穴浓度,从而提高太阳能电池的性能。然而,它们的掺杂效率受到补偿供体缺陷的形成的限制,其浓度取决于合金成分、加工温度和镉在晶界的偏析。我们使用密度泛函理论(DFT)和晶格蒙特卡罗(LMC)来确定最低能量的Se/Te合金结构,并了解温度和局部合金结构对As/P缺陷形成的影响。然后,基于DFT和LMC计算结果,采用连续体模拟来探索不同生长温度、初始化学势和合金成分下CdSeTe中As/P的可掺杂性。此外,还研究了Cd在晶界处的偏析,以了解其对补偿缺陷的影响。我们的LMC模拟结果表明,在CdSeTe中,P应该是比As更有效的P型掺杂剂,而随着Se含量的增加,这两种掺杂剂的有效性都降低了。此外,连续介质模拟表明,掺杂As和P都能提高P型电导率,在873 K初始生长温度下,两者的空穴密度均达到1016 cm-3,在1173 K初始生长温度下,两者的空穴密度均达到1017 cm-3。我们发现,控制化学势和补偿缺陷的形成对于优化载流子密度和掺杂激活效率并确保它们保持稳定至关重要。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Multiscale Modeling and Optimization of Group V Doping and Compensation in CdSexTe1–x

Multiscale Modeling and Optimization of Group V Doping and Compensation in CdSexTe1–x

This study investigates the defect properties and doping limitations of group V elements in CdSexTe1–x. Group V acceptor dopants are able to increase hole concentrations and thereby enhance solar cell performance. However, their doping efficiency is limited by the formation of compensating donor defects with concentrations that depend on alloy composition, processing temperatures, and Cd segregation into grain boundaries. We use density functional theory (DFT) and lattice Monte Carlo (LMC) to identify the lowest-energy Se/Te alloy configurations and to understand the impact of temperature and local alloy configuration on As/P defect formation. Continuum simulations were then employed based on the results of the DFT and LMC calculations to explore As/P dopability in CdSeTe under various growth temperatures, initial chemical potentials, and alloy compositions. Moreover, the segregation of Cd at grain boundaries was investigated to understand its impact on compensating defects. The results of our LMC simulations suggest that P should be a more effective p-type dopant than As in CdSeTe, while both dopants become less effective as Se content increases. Additionally, the continuum simulations highlight that both As and P doping can enhance p-type conductivity, and both of them can reach hole density on the order of 1016 cm–3 for 873 K initial growth temperature and 1017 cm–3 for 1173 K initial growth temperature. We find that managing chemical potentials and the formation of compensating defects is crucial for optimizing carrier density and dopant activation efficiency and ensuring they remain stable.

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来源期刊
ACS Applied Energy Materials
ACS Applied Energy Materials Materials Science-Materials Chemistry
CiteScore
10.30
自引率
6.20%
发文量
1368
期刊介绍: ACS Applied Energy Materials is an interdisciplinary journal publishing original research covering all aspects of materials, engineering, chemistry, physics and biology relevant to energy conversion and storage. The journal is devoted to reports of new and original experimental and theoretical research of an applied nature that integrate knowledge in the areas of materials, engineering, physics, bioscience, and chemistry into important energy applications.
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