IF 2.1 3区 工程技术 Q2 MICROSCOPY
Mingyu Duan, Chengjian Wu, Jinyan Tang, Yuyang Wang, Shiquan Liu, Bing-Feng Ju, Yuan-Liu Chen
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引用次数: 0

摘要

超声原子力显微镜(UAFM)是一种功能强大的无损次表面成像工具,被广泛用于检测材料缺陷和分析生物细胞。超声原子力显微镜图像的对比度对次表层成像质量至关重要,它直接受到探头与材料之间接触力的影响。这种接触力通过影响应力场从振动探头向材料的传播来影响次表层对比度。因此,优化接触力对于获得更好的次表层对比度、更高的分辨率和更大的可探测深度至关重要。本文提出了一个模型,用于确定高对比度、高分辨率次表层成像的最佳接触力。该模型的设计目的是改善具有广泛杨氏模量(从几十到几百 GPa)的样品的 UAFM 成像。该模型的使用大大提高了成像质量,可探测深度超过 337.7 纳米,横向分辨率低于 56.9 纳米。因此,与在任意接触力条件下进行的实验相比,该模型显示了更好的结果。这项研究为优化地表下成像、增强对比度、提高分辨率和增加可探测深度提供了一条途径。因此,这项研究的结果有助于提高地表下成像技术的能力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Enhancing subsurface imaging in ultrasonic atomic force microscopy with optimized contact force.

Ultrasonic atomic force microscopy (UAFM) is a powerful nondestructive subsurface imaging tool that is widely used to inspect material defects and analyze biological cells. The contrast in UAFM images, which is crucial for subsurface imaging quality, is directly influenced by the contact force between the probe and material. This contact force affects the subsurface contrast by influencing the propagation of the stress field from the vibrating probe into the material. Therefore, optimizing the contact force is essential for achieving superior subsurface contrast with better resolution and greater detectable depth. This paper proposes a model for determining the optimal contact force for high-contrast, high-resolution subsurface imaging. The model was designed to improve UAFM imaging across samples with a wide range of Young's moduli, from tens to hundreds of GPa. The use of this model resulted in significant improvements to imaging quality, with a detectable depth exceeding 337.7 nm and lateral resolution below 56.9 nm. Hence, this model demonstrates better results than experiments conducted under arbitrary contact forces. This study provides a pathway for optimizing subsurface imaging and delivering enhanced contrast, higher resolution, and greater detectable depth. Consequently, the results of this study contribute to the advancement of the capabilities of subsurface imaging techniques.

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来源期刊
Ultramicroscopy
Ultramicroscopy 工程技术-显微镜技术
CiteScore
4.60
自引率
13.60%
发文量
117
审稿时长
5.3 months
期刊介绍: Ultramicroscopy is an established journal that provides a forum for the publication of original research papers, invited reviews and rapid communications. The scope of Ultramicroscopy is to describe advances in instrumentation, methods and theory related to all modes of microscopical imaging, diffraction and spectroscopy in the life and physical sciences.
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