最先进的电子束用于超快科学的紧凑工具。

IF 2.1 3区 工程技术 Q2 MICROSCOPY
Ultramicroscopy Pub Date : 2025-01-01 Epub Date: 2024-11-26 DOI:10.1016/j.ultramic.2024.114080
Peter Salén, Anatoliy Opanasenko, Giovanni Perosa, Vitaliy Goryashko
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引用次数: 0

摘要

我们回顾了最先进的电子束用于单次百万电子伏特超快电子衍射(MeV-UED)和紧凑光源。我们的主要重点是在2-30 MeV能量范围内的100飞秒以下的电子束。我们证明了我们新的和最近的模拟结果允许在这些应用中显著改善束参数。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
State-of-the-art electron beams for compact tools of ultrafast science.

We review state-of-the-art electron beams for single-shot megaelectronvolt ultrafast electron diffraction (MeV-UED) and compact light sources. Our primary focus is on sub-100 femtosecond electron bunches in the 2-30 MeV energy range. We demonstrate that our new and recent simulation results permit significantly improved bunch parameters for these applications.

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来源期刊
Ultramicroscopy
Ultramicroscopy 工程技术-显微镜技术
CiteScore
4.60
自引率
13.60%
发文量
117
审稿时长
5.3 months
期刊介绍: Ultramicroscopy is an established journal that provides a forum for the publication of original research papers, invited reviews and rapid communications. The scope of Ultramicroscopy is to describe advances in instrumentation, methods and theory related to all modes of microscopical imaging, diffraction and spectroscopy in the life and physical sciences.
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