Jiangfan Wang , Weichao Yuan , Li'an Zhu , Zhen Wang , Yicong Ye , Shun Li , Yu Tang , Shuxin Bai
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引用次数: 0
摘要
铼(Re)在高温下具有优异的机械性能和抗气体腐蚀性能,适合在高温环境中用作基底和涂层,因此受到广泛关注。在各种制备方法中,电沉积具有效率高、成本效益高、对基底形状不敏感等优点,是一种很有前途的 Re 涂层和元件制造方法。有关氯化物熔盐体系的研究十分普遍,但涂层缺陷往往来自歧化反应,而歧化反应是决定涂层质量的关键因素。为了评估 Re 离子在熔盐中的稳定性并优化电沉积,我们研究了大气条件、熔盐成分和电极材料的影响。我们的研究结果表明,Re 离子在熔盐中的稳定性很差,容易在界面上发生歧化反应,形成 ReCl5 和 Re。氩气环境中氧气的存在促进了歧化反应,而氯气则抑制了反应。熔盐的成分会影响 Re 离子的结构;阳离子半径越大,Re 离子的稳定性越高。在电极表面也观察到类似的催化行为,不稳定的 Re 离子在电极表面发生歧化,削弱了界面结合力,增加了缺陷。
Impact of rhenium ion stability on coating quality in chloride molten salts
Rhenium (Re) has received considerable attention due to its excellent mechanical properties at high temperatures and resistance to gas corrosion, making it suitable for high-temperature environments as a substrate and coating. Among various preparation methods, electrodeposition offers high efficiency, cost-effectiveness, and substrate shape insensitivity, making it a promising approach for Re coating and component fabrication. Research on chloride molten salt systems is prevalent; however, coating defects often arise from disproportionation reactions, a critical determinant of coating quality. To assess Re ion stability in molten salts and optimise electrodeposition, the effects of atmospheric conditions, molten salt composition, and electrode materials were investigated. Our findings revealed poor Re ion stabilisation in molten salts, susceptible to disproportionation reactions at interfaces forming ReCl5 and Re. The presence of oxygen in an argon atmosphere promoted the disproportionation reaction, whereas, chlorine inhibited the reaction. The composition of the molten salt affected the Re ion structure; a larger cation radius increased Re ion stability. Similar catalytic behaviour was observed on electrode surfaces, where unstable Re ions disproportionated, weakening interfacial bonding and increasing defects.
期刊介绍:
Materials Chemistry and Physics is devoted to short communications, full-length research papers and feature articles on interrelationships among structure, properties, processing and performance of materials. The Editors welcome manuscripts on thin films, surface and interface science, materials degradation and reliability, metallurgy, semiconductors and optoelectronic materials, fine ceramics, magnetics, superconductors, specialty polymers, nano-materials and composite materials.