旋涂氧化镁 (MgO) 的化学和结构特征及其对作为界面层的金/未掺杂 InP 肖特基触点的势垒参数和电流传导过程的影响

IF 2.1 4区 物理与天体物理 Q3 PHYSICS, CONDENSED MATTER
S. Sai Krupa , D. Surya Reddy , V. Rajagopal Reddy , Chel-Jong Choi
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引用次数: 0

摘要

这项研究探讨了未掺杂 InP(un-InP)上旋涂氧化镁(MgO)的结构和化学特性及其对金/未掺杂 InP 肖特基接触(SC)中的势垒参数和电流传输现象的影响。利用 XRD 和 XPS 评估了氧化镁的结构和化学特征,证实氧化镁沉积在未掺杂 InP 上。测量了SC和金/氧化镁/未铟磷金属/绝缘体/半导体(MIS)型肖特基触点的电流-电压(log(I)-V)特征。与 SC 相比,MIS 触点具有出色的整流性能。计算得出的 MIS 触点的势垒高度(Φb)(0.61 eV)高于 SC(0.52 eV),这意味着 MgO 中间层影响了 SC 的Φb。此外,还使用 Cheung's、Mikhelashvili 和 Norde 程序估算了 Φb 值,其值相近,表明其稳定性和可靠性。MIS 触点获得的界面态密度(NSS)小于 SC,证明氧化镁夹层降低了 NSS。在正向偏压下,SC 和 MIS 触点在低偏压区观察到欧姆行为,而 MIS 触点在中等偏压区和高偏压区观察到无阱空间电荷限制电流(SCLC)。在反向偏压下,普尔-弗伦克尔发射(PFE)在较低偏压下占主导地位,而肖特基发射(SE)则在 SC 和 MIS 触点的较高偏压下占主导地位。这些发现证明了氧化镁中间膜在先进电子器件中的潜在应用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Chemical and structural features of spin-coated magnesium oxide (MgO) and its impact on the barrier parameters and current conduction process of Au/undoped-InP Schottky contact as an interfacial layer
This work examines the structural and chemical characteristics of spin-coated magnesium oxide (MgO) on undoped InP (un-InP) and its effects on the barrier parameters and current transport phenomena in the Au/un-InP Schottky contact (SC). Using XRD and XPS, the structural and chemical features of MgO are assessed, confirming that the MgO was deposited on un-InP. The current-voltage (log(I)-V) features were measured for the SC and Au/MgO/un-InP metal/insulator/semiconductor (MIS)-type Schottky contact. The MIS contact revealed an excellent rectification behavior as compared to the SC. The calculated barrier height (Φb) was higher for the MIS contact (0.61 eV) than the SC (0.52 eV), which implies that the MgO interlayer influences the Φb of the SC. The Φb was also estimated using the Cheung's, Mikhelashvili and Norde procedures, the values are similar, indicating their stability and reliability. The acquired interface state density (NSS) of the MIS contact was less than the SC, proving that the MgO interlayer reduced the NSS. The ohmic behavior was observed in the lower bias region for the SC and MIS contacts, while the trap-free space-charge-limited current (SCLC) was noted in the moderate and upper bias regions of the MIS contact under forward bias. Poole-Frenkel emission (PFE) governs at a lower bias, while Schottky emission (SE) dominates at the upper bias of SC and MIS contacts under reverse bias. These findings demonstrate the potential application of MgO interlayer in advancing electronic devices.
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来源期刊
Solid State Communications
Solid State Communications 物理-物理:凝聚态物理
CiteScore
3.40
自引率
4.80%
发文量
287
审稿时长
51 days
期刊介绍: Solid State Communications is an international medium for the publication of short communications and original research articles on significant developments in condensed matter science, giving scientists immediate access to important, recently completed work. The journal publishes original experimental and theoretical research on the physical and chemical properties of solids and other condensed systems and also on their preparation. The submission of manuscripts reporting research on the basic physics of materials science and devices, as well as of state-of-the-art microstructures and nanostructures, is encouraged. A coherent quantitative treatment emphasizing new physics is expected rather than a simple accumulation of experimental data. Consistent with these aims, the short communications should be kept concise and short, usually not longer than six printed pages. The number of figures and tables should also be kept to a minimum. Solid State Communications now also welcomes original research articles without length restrictions. The Fast-Track section of Solid State Communications is the venue for very rapid publication of short communications on significant developments in condensed matter science. The goal is to offer the broad condensed matter community quick and immediate access to publish recently completed papers in research areas that are rapidly evolving and in which there are developments with great potential impact.
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